The characteristics of holographic grating in chalcogenide thin films

Abstract

We have investigated the polarization dependence of holographic gratings in chalcogenide Se/sub 75/Ge/sub 25/ and As/sub 40/Ge/sub 10/Se/sub 15/S/sub 35/ thin films. The films have been irradiated using a linearly polarized He-Ne laser at 633 nm. To observe the etching characteristic, the films have been etched with NaOH solution. Film thicknesses were about 1 /spl mu/m and 3 /spl mu/m, and were monitored with a quartz oscillator during deposition and measured with the NKT1200 analyzer. A self-relief grating was formed in As/sub 40/Ge/sub 10/Se/sub 15/S/sub 35/ thin film.