Correction of Interferometric High-Order Nonlinearity Error in Metrological Atomic Force Microscopy

Q1 Engineering

Nanomanufacturing and Metrology Pub Date : 2022-10-06 DOI:10.1007/s41871-022-00154-6

G. Dai, Xiukun Hu

引用次数: 6

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计量原子力显微镜干涉高阶非线性误差的校正

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Nanomanufacturing and Metrology Materials Science-Materials Science (miscellaneous)

CiteScore

5.40

自引率

0.00%

发文量

期刊介绍： Nanomanufacturing and Metrology is a peer-reviewed, international and interdisciplinary research journal and is the first journal over the world that provides a principal forum for nano-manufacturing and nano-metrology.Nanomanufacturing and Metrology publishes in the forms including original articles, cutting-edge communications, timely review papers, technical reports, and case studies. Special issues devoted to developments in important topics in nano-manufacturing and metrology will be published periodically.Nanomanufacturing and Metrology publishes articles that focus on, but are not limited to, the following areas:• Nano-manufacturing and metrology• Atomic manufacturing and metrology• Micro-manufacturing and metrology• Physics, chemistry, and materials in micro-manufacturing, nano-manufacturing, and atomic manufacturing• Tools and processes for micro-manufacturing, nano-manufacturing and atomic manufacturing