Study of electromagnetic interference from a high power copper vapor laser

2005 International Symposium on Electromagnetic Compatibility, 2005. EMC 2005. Pub Date : 2005-10-03 DOI:10.1109/ISEMC.2005.1513643

A. Gayen, B. Das, D. R. Poddar

{"title":"Study of electromagnetic interference from a high power copper vapor laser","authors":"A. Gayen, B. Das, D. R. Poddar","doi":"10.1109/ISEMC.2005.1513643","DOIUrl":null,"url":null,"abstract":"The copper-vapor laser (CVL) is a high power pulsed-electric discharge pumped laser. The laser lases in copper vapor media By heating the copper pieces to evaporation temperature (/spl sim/1500 /spl deg/C), copper vapors are generated in the laser head. The thermal energy required for heating the copper metal to vaporization is supplied through the excitation pulse. The discharge excitation is at a rate between 2 to 20 kHz. A pulse power supply unit (PPSU) generates the high voltage pulse (electrical pulse having voltage of the order of 15 to 20 kV at 1 to 2 kA for duration of /spl sim/600 nS), which is obtained by using a resonant charging circuit. Thus the PPSU generates power of the order of Megawatt (/spl sim/20 MW). Hence the power supply unit along with the high voltage (HV) cable carrying the electrical pulse to the laser head is a source of electromagnetic interference (EMI). In addition the laser head where the discharge takes place is also a source of electromagnetic noise. The paper presents a study of electromagnetic interference from a high power copper vapor laser system.","PeriodicalId":6459,"journal":{"name":"2005 International Symposium on Electromagnetic Compatibility, 2005. EMC 2005.","volume":"45 1","pages":"847-850 Vol. 3"},"PeriodicalIF":0.0000,"publicationDate":"2005-10-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"8","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2005 International Symposium on Electromagnetic Compatibility, 2005. EMC 2005.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISEMC.2005.1513643","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 8

Abstract

The copper-vapor laser (CVL) is a high power pulsed-electric discharge pumped laser. The laser lases in copper vapor media By heating the copper pieces to evaporation temperature (/spl sim/1500 /spl deg/C), copper vapors are generated in the laser head. The thermal energy required for heating the copper metal to vaporization is supplied through the excitation pulse. The discharge excitation is at a rate between 2 to 20 kHz. A pulse power supply unit (PPSU) generates the high voltage pulse (electrical pulse having voltage of the order of 15 to 20 kV at 1 to 2 kA for duration of /spl sim/600 nS), which is obtained by using a resonant charging circuit. Thus the PPSU generates power of the order of Megawatt (/spl sim/20 MW). Hence the power supply unit along with the high voltage (HV) cable carrying the electrical pulse to the laser head is a source of electromagnetic interference (EMI). In addition the laser head where the discharge takes place is also a source of electromagnetic noise. The paper presents a study of electromagnetic interference from a high power copper vapor laser system.

查看原文本刊更多论文

大功率铜蒸气激光器的电磁干扰研究

铜蒸气激光器(CVL)是一种高功率脉冲放电泵浦激光器。铜蒸气介质中的激光通过将铜片加热到蒸发温度(/spl sim/1500 /spl℃)，在激光头中产生铜蒸气。将铜金属加热至汽化所需的热能通过激发脉冲提供。放电激励的频率在2到20千赫之间。脉冲电源单元(PPSU)通过使用谐振充电电路产生高压脉冲(1至2 kA电压为15至20 kV，持续时间为/spl sim/600 nS的电脉冲)。因此，PPSU产生兆瓦级(/spl sim/20兆瓦)的功率。因此，电源单元以及携带电脉冲到激光头的高压(HV)电缆是电磁干扰(EMI)的来源。此外，放电发生的激光头也是电磁噪声的来源。本文研究了高功率铜蒸气激光系统的电磁干扰。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

求助全文

约1分钟内获得全文求助全文

来源期刊

2005 International Symposium on Electromagnetic Compatibility, 2005. EMC 2005.

自引率

0.00%

发文量