Studies on electrical characteristics of organic-inorganic heterostructures

N. S. Das, K. K. Gogoi, R. Das, A. Chowdhury
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Abstract

Herein, we report the electrical properties of a heterostructure based on n-Si (100) and zinc phthalocyanine (ZnPc) thin films which displays asymmetric current-voltage (I-V) characteristics under the applied voltage sweep. ZnPc thin films were deposited onto clean silicon wafers and quartz substrates through vacuum thermal evaporation technique. Spectroscopic techniques such as UV-visible, PL and FTIR were used in order to investigate the optical properties of the thin films. The α-phase of the as deposited ZnPc film was recognized from the positions and intensity of the peak in the visible region of UV-visible spectroscopy. Optical energy gap of the deposited ZnPc thin film was estimated from the Tauc’s plot and the result is compared with PL spectra. PL spectra show a strong peak located at around ∼ 392 nm, which corresponds to an energy of ∼ 3.13 eV. Microstructural properties of the thin film were studied by the X-ray diffraction which shows preferential orientation along (200) direction and a broad hump appears at around 2θ ∼ 30°. SEM and AFM images display uniform growth of ZnPc thin films, comprising spherical nanoparticles over the substrate surface. The surface RMS roughness of the thin film was estimated from AFM analysis and found to be around ∼ 5.3 nm. The room temperature electrical studies of the fabricated device (Al/n-Si (100)/ ZnPc/ Al) were performed which displays rectifying character in the positive sweep and electrical hysteresis at negative voltage sweep. A suitable energy band diagram is proposed to explain the electrical property of the heterojunction device.Herein, we report the electrical properties of a heterostructure based on n-Si (100) and zinc phthalocyanine (ZnPc) thin films which displays asymmetric current-voltage (I-V) characteristics under the applied voltage sweep. ZnPc thin films were deposited onto clean silicon wafers and quartz substrates through vacuum thermal evaporation technique. Spectroscopic techniques such as UV-visible, PL and FTIR were used in order to investigate the optical properties of the thin films. The α-phase of the as deposited ZnPc film was recognized from the positions and intensity of the peak in the visible region of UV-visible spectroscopy. Optical energy gap of the deposited ZnPc thin film was estimated from the Tauc’s plot and the result is compared with PL spectra. PL spectra show a strong peak located at around ∼ 392 nm, which corresponds to an energy of ∼ 3.13 eV. Microstructural properties of the thin film were studied by the X-ray diffraction which shows preferential orientation along (200) direction and a broad ...
有机-无机异质结构的电特性研究
在此,我们报道了基于n-Si(100)和酞菁锌(ZnPc)薄膜的异质结构的电学性质,该薄膜在外加电压扫描下表现出不对称的电流-电压(I-V)特性。采用真空热蒸发技术将ZnPc薄膜沉积在干净的硅片和石英衬底上。利用紫外可见、PL和FTIR等光谱技术研究了薄膜的光学性质。通过紫外可见光谱中α-相峰的位置和强度可以识别出沉积的ZnPc膜的α-相。利用Tauc图估计了沉积的ZnPc薄膜的光能隙,并与PL光谱进行了比较。PL光谱在~ 392 nm处有一个强峰,对应于能量为~ 3.13 eV。通过x射线衍射对薄膜的微观结构进行了研究,发现薄膜沿(200)方向有优先取向,在2θ ~ 30°附近出现一个宽驼峰。SEM和AFM图像显示ZnPc薄膜均匀生长,在衬底表面上包含球形纳米颗粒。薄膜的表面RMS粗糙度由AFM分析估计,发现约为~ 5.3 nm。对制备的Al/n-Si (100)/ ZnPc/ Al器件进行了室温电学研究,该器件在正扫电压下具有整流特性,在负扫电压下具有电滞回特性。提出了一种合适的能带图来解释异质结器件的电学特性。在此,我们报道了基于n-Si(100)和酞菁锌(ZnPc)薄膜的异质结构的电学性质,该薄膜在外加电压扫描下表现出不对称的电流-电压(I-V)特性。采用真空热蒸发技术将ZnPc薄膜沉积在干净的硅片和石英衬底上。利用紫外可见、PL和FTIR等光谱技术研究了薄膜的光学性质。通过紫外可见光谱中α-相峰的位置和强度可以识别出沉积的ZnPc膜的α-相。利用Tauc图估计了沉积的ZnPc薄膜的光能隙,并与PL光谱进行了比较。PL光谱在~ 392 nm处有一个强峰,对应于能量为~ 3.13 eV。用x射线衍射研究了薄膜的微观结构性能,发现薄膜沿(200)方向优先取向,且薄膜的取向范围较宽。
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