Morphology control of LiCoO2 thin film prepared by pulsed laser deposition

Desheng Liu, Yun Chao, Shengnan Wu, Shuying Zhong, M. Lei
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引用次数: 1

Abstract

LiCoO2 thin film samples have been prepared by pulsed laser deposition under different deposition conditions. A series of tests have been done to investigate the relationship between the film quality and the deposition conditions. The results from XRD show that the LiCoO2 films deposited by PLD thermodynamically tend to form (003) preferred orientation. But the films grown at high repetition rate (35Hz) and low oxygen pressure (1Pa) show a random orientation. SEM and AFM images reveal that the size and uniformity of LiCoO2 crystalline grains is directly depends on the deposition temperature and repetition rate. Therefore, by adjusting the deposition parameters, to achieve the purpose of LiCoO2 thin film morphology control is feasible.
脉冲激光沉积LiCoO2薄膜的形貌控制
在不同的沉积条件下,采用脉冲激光沉积法制备了LiCoO2薄膜样品。通过一系列试验研究了沉积条件与薄膜质量的关系。XRD结果表明,PLD沉积的LiCoO2薄膜在热力学上倾向于形成(003)择优取向。而在高重复频率(35Hz)和低氧分压(1Pa)条件下生长的薄膜表现出随机取向。SEM和AFM图像显示,LiCoO2晶粒的尺寸和均匀性直接取决于沉积温度和重复速率。因此,通过调节沉积参数,达到控制LiCoO2薄膜形貌的目的是可行的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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