Nanometer-Scale Imaging of Inhomogeneous Active Charge Carriers in Arsenic-Doped CdTe Thin Films

C. Jiang, J. Moseley, C. Xiao, S. Harvey, E. Colegrove, W. Metzger, M. Al‐Jassim
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Abstract

We report nanometer-scale imaging of active carrier distribution of As-doped CdTe films by scanning capacitance microscopy (SCM). We developed SCM sample preparation for CdTe by ion-milling followed by thermal processing. The nanometer-resolution carrier delineation for CdTe was validated by imaging on a CdTe cross-section sample made by a molecular beam epitaxy layer stack with As-doping concentrations of 1015~1018/cm3. We found that the carrier distribution in As-doped films was significantly nonuniform, with inhomogeneity ranging from sub-μm to a few μm and concentration variation of one order of magnitude (low 1016 to low 1017/cm3). This nonuniformity is distributed randomly, independent of grain structure and grain boundary (GB). We used Kelvin probe force microscopy (KPFM) and cathodoluminescence (CL) to further map the surface potential and radiative illumination on the same area as the SCM image. Higher potential and lower CL intensity were found on GBs but not on SCM contrast, illustrating positive GB charging and GB recombination but not GB-distinguished doping. The overall KPFM potential image is in rough agreement with the SCM carrier distribution, in terms of Fermi-level position relative to the bandgap edge—thus resulting in the band-edge potential fluctuation. Nonuniform carrier concentration, potential fluctuation, and defect recombination can all together cause the Voc deficit of the As-doped CdTe device.
砷掺杂CdTe薄膜中非均匀活性电荷载流子的纳米成像
我们报道了用扫描电容显微镜(SCM)对砷掺杂CdTe薄膜的有源载流子分布的纳米级成像。采用离子铣削和热加工的方法制备了碲化镉的单片机样品。通过对掺杂浓度为1015~1018/cm3的分子束外延层堆叠的CdTe横截面样品进行成像,验证了CdTe的纳米分辨率载流子描述。我们发现as掺杂薄膜中的载流子分布明显不均匀,不均匀性从亚μm到几μm不等,浓度变化为一个数量级(低1016到低1017/cm3)。这种非均匀性是随机分布的,与晶粒结构和晶界(GB)无关。我们使用开尔文探针力显微镜(KPFM)和阴极发光(CL)进一步绘制了与SCM图像相同区域的表面电位和辐射照明。在GB对比上发现了更高的电位和更低的CL强度,而在SCM对比上没有发现,说明了GB正充电和GB重组,而不是GB区分掺杂。总的KPFM电位图像在相对于带隙边缘的费米能级位置上与SCM载流子分布大致一致,从而导致带隙边缘电位波动。载流子浓度不均匀、电势波动和缺陷复合都会导致掺as CdTe器件的Voc亏缺。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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