Damage resistance of B4C reflective mirror irradiated by X-ray free-electron laser

IF 3.3 2区物理与天体物理 Q2 OPTICS

Chinese Optics Letters Pub Date : 2023-01-01 DOI:10.3788/col202321.023401

Jinyu Cao, Shuhui Li, Yajun Tong, Ming-Dou Tang, Wenbin Li, Qiushi Huang, Huaidong Jiang, Zhanshan Wang

引用次数: 1

Abstract

In this paper, a simple theoretical model combining Monte Carlo simulation with the enthalpy method is provided to simulate the damage resistance of B 4 C/Si-sub mirror under X-ray free-electron laser irradiation. Two different damage mechanisms are found, dependent on the photon energy. The optimum B 4 C film thickness is determined by studying the dependence of the damage resistance on the film thickness. Based on the optimized film thickness, the damage thresholds are simulated at photon energy of 0.4 – 25 keV and a grazing incidence angle of 2 mrad. It is recommended that the energy range around the Si K-edge should be avoided for safety reasons.

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x射线自由电子激光辐照B4C反射镜的抗损伤性

本文提出了一种简单的理论模型，将蒙特卡罗模拟与焓法相结合，模拟了b4c / si亚镜在x射线自由电子激光照射下的损伤抗力。根据光子能量的不同，发现了两种不同的损伤机制。通过研究损伤抗力与膜厚的关系，确定了最佳的b4c膜厚度。基于优化后的膜厚，在光子能量为0.4 ~ 25 keV，掠射入射角为2 mrad的条件下，模拟了损伤阈值。出于安全考虑，建议避免在Si - k边缘附近的能量范围内使用。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Chinese Optics Letters 物理-光学

CiteScore

5.60

自引率

20.00%

发文量

180

审稿时长

2.3 months

期刊介绍： Chinese Optics Letters (COL) is an international journal aimed at the rapid dissemination of latest, important discoveries and inventions in all branches of optical science and technology. It is considered to be one of the most important journals in optics in China. It is collected by The Optical Society (OSA) Publishing Digital Library and also indexed by Science Citation Index (SCI), Engineering Index (EI), etc. COL is distinguished by its short review period (~30 days) and publication period (~100 days). With its debut in January 2003, COL is published monthly by Chinese Laser Press, and distributed by OSA outside of Chinese Mainland.