Additive manufacturing applications of phase-field-based topology optimization using adaptive isogeometric analysis

Q1 Mathematics
Massimo Carraturo, Paul Hennig, Gianluca Alaimo, Leonhard Heindel, Ferdinando Auricchio, Markus Kästner, Alessandro Reali
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引用次数: 10

Abstract

In this contribution, we apply adaptive isogeometric analysis to a diffuse interface model for topology optimization. First, the influence of refinement and coarsening parameters on the optimization procedure are evaluated and discussed on a two‐dimensional problem and a possible workflow to convert smooth isogeometric solutions into 3D printed products is described. Second, to assess the required numerical accuracy of the proposed simulation framework, numerical results obtained adopting different stopping criteria are experimentally evaluated for a three‐dimensional benchmark problem.

Abstract Image

增材制造中基于相场的自适应等几何分析拓扑优化应用
在这篇贡献中,我们将自适应等几何分析应用于漫射界面模型的拓扑优化。首先,在二维问题上评估和讨论了精化和粗化参数对优化过程的影响,并描述了将光滑等几何解转化为3D打印产品的可能工作流程。其次,为了评估所提出的仿真框架所需的数值精度,对三维基准问题采用不同停止准则得到的数值结果进行了实验评估。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
GAMM Mitteilungen
GAMM Mitteilungen Mathematics-Applied Mathematics
CiteScore
8.80
自引率
0.00%
发文量
23
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