Sub-550mV SRAM Design in 22nm FinFET Low Power (22FFL) Technology with Self-Induced Collapse Write Assist

Daeyeon Kim, J. Wiedemer, P. Kolar, Ayushi Shrivastava, Jinal Shah, Satyanand Nalam, Gwanghyeon Baek, Xiaofei Wang, Z. Guo, E. Karl
{"title":"Sub-550mV SRAM Design in 22nm FinFET Low Power (22FFL) Technology with Self-Induced Collapse Write Assist","authors":"Daeyeon Kim, J. Wiedemer, P. Kolar, Ayushi Shrivastava, Jinal Shah, Satyanand Nalam, Gwanghyeon Baek, Xiaofei Wang, Z. Guo, E. Karl","doi":"10.1109/VLSIT.2018.8510704","DOIUrl":null,"url":null,"abstract":"Exceptionally low minimum operating voltage (V<inf>MIN</inf>) SRAM arrays have been demonstrated on 22nm FinFET low power technology (22FFL) [1]. By optimizing an undoped SRAM transistor and applying industry standard write assist techniques, 16Mb array of 0.087μm<sup>2</sup> high-density bitcell (HDC) and 32Mb array of 0.107μm<sup>2</sup> high-current bitcell (HCC) achieve the 95<sup>th</sup> percentile V<inf>MIN</inf> of 505mV and 450mV respectively across a temperature range of -10°C to 95°C. A self-induced collapse (SIC) write assist integrated into the 6-T HDC SRAM bitcell array enables 110mV V<inf>MIN</inf> reduction relative to an unassisted array at the 95<sup>th</sup> percentile with negligible power overhead.","PeriodicalId":6561,"journal":{"name":"2018 IEEE Symposium on VLSI Technology","volume":"2 1","pages":"151-152"},"PeriodicalIF":0.0000,"publicationDate":"2018-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 IEEE Symposium on VLSI Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSIT.2018.8510704","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3

Abstract

Exceptionally low minimum operating voltage (VMIN) SRAM arrays have been demonstrated on 22nm FinFET low power technology (22FFL) [1]. By optimizing an undoped SRAM transistor and applying industry standard write assist techniques, 16Mb array of 0.087μm2 high-density bitcell (HDC) and 32Mb array of 0.107μm2 high-current bitcell (HCC) achieve the 95th percentile VMIN of 505mV and 450mV respectively across a temperature range of -10°C to 95°C. A self-induced collapse (SIC) write assist integrated into the 6-T HDC SRAM bitcell array enables 110mV VMIN reduction relative to an unassisted array at the 95th percentile with negligible power overhead.
基于22nm FinFET低功耗(22FFL)技术的550mv SRAM设计
超低工作电压(VMIN) SRAM阵列已经在22nm FinFET低功耗技术(22FFL)上得到了验证[1]。通过优化无药SRAM晶体管并应用行业标准的写辅助技术,16Mb的0.087μm2高密度位单元(HDC)阵列和32Mb的0.107μm2高电流位单元(HCC)阵列在-10°C至95°C的温度范围内分别实现了505mV和450mV的95个百分点的VMIN。集成在6-T HDC SRAM位单元阵列中的自诱导崩溃(SIC)写入辅助系统,相对于无辅助阵列,可将VMIN降低110mV,降低95个百分点,而功率开销可以忽略。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信