Single Event Transient Compact Model for FDSOI MOSFETs Taking Bipolar Amplification and Circuit Level Arbitrary Generation Into Account

N. Rostand, S. Martinie, J. Lacord, O. Rozeau, T. Poiroux, G. Hubert
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Abstract

Single Event Transients (SET) are ionizing particles induced current pulses which are able to generate soft errors in CMOS circuits. In Silicon-on-Insulator (SOI) technologies, bipolar amplification phenomena is more significant due to presence of the Burried Oxide (BOX), which is detrimental to soft errors sensitivity. State of the art FDSOI SET models account for bipolar amplification through a dynamic pre-factor. This approach is mainly empirical and not compact. In this work, we propose a SET compact model for FDSOI MOSFETs including a physical modeling of bipolar amplification. Results are validated through TCAD simulations. A circuit level approach is proposed considering arbitrary generation within functional SRAM cell. This approach allows more realistic Single Event Upset (SEU) prediction and we show how circuit level generation can influence SEU prediction.
考虑双极放大和电路电平任意产生的FDSOI mosfet单事件瞬态紧凑模型
单事件瞬变(SET)是一种在CMOS电路中产生软误差的电离粒子感应电流脉冲。在绝缘体上硅(SOI)技术中,由于氧化层(BOX)的存在,双极放大现象更加明显,这对软误差灵敏度有害。最先进的FDSOI SET模型通过一个动态预因子来考虑双极放大。这种方法主要是经验性的,并不紧凑。在这项工作中,我们提出了一个FDSOI mosfet的SET紧凑模型,包括双极放大的物理建模。通过TCAD仿真验证了结果。提出了一种考虑功能SRAM单元内任意生成的电路级方法。这种方法允许更现实的单事件干扰(SEU)预测,我们展示了电路电平生成如何影响SEU预测。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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