Laser bonding of copper ribbons and clips on SiC power MOSFETs with sintered copper bond buffers

N. Pavliček, Fabian Mohn
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引用次数: 3

Abstract

The source (emitter) contact of MOSFETs (IGBTs) is one of the most sensitive joints of power semiconductor modules. Due to limitations with regards to current density and power cycling reliability, state-of-the-art aluminum wire bonding is replaced, for example, by copper wire or ribbon bonding. In this study, a novel laser micro welding technology has been implemented to connect the source contact of 1.2 kV SiC MOSFETs reinforced by silver-sintered copper bond buffer top plates. The feasibility of laser bonding of 0.3 mm thick copper ribbons or 0.15 mm thick copper clips has been investigated on bond buffer top plates of 0.1 mm or 0.15 mm thickness.The laser bonding process was optimized by optical inspection of the weld seam, shear strength measurements of the bonds, analysis of polished micrograph sections, and electrical characterization of the power MOSFETs. Shear strength values exceeding 200 MPa have been repeatedly achieved for all material combinations. Results of electrical characterization are promising, and optically impeccable welding seams strongly correlate with electrically functional semiconductor devices. Power cycling of encapsulated power modules is currently ongoing, and results will be presented.An outlook is given on future measures to further improve the laser bonding process, and we discuss how laser bonding compares to other advanced topside interconnection methods.
烧结铜键缓冲器在SiC功率mosfet上的铜带和铜夹激光键合
mosfet (igbt)的源(极)触点是功率半导体模块中最敏感的接头之一。由于电流密度和功率循环可靠性的限制,最先进的铝线键合被铜线或带状键合所取代。在本研究中,实现了一种新型的激光微焊接技术,用于连接由银烧结铜键缓冲顶板增强的1.2 kV SiC mosfet的源触点。研究了在0.1 mm或0.15 mm厚度的键合缓冲顶板上激光键合0.3 mm厚铜带或0.15 mm厚铜夹的可行性。通过对焊缝的光学检测、键合的剪切强度测量、抛光显微切片分析以及功率mosfet的电学表征,对激光键合工艺进行了优化。所有材料组合的抗剪强度均已反复达到200兆帕以上。电学表征的结果是有希望的,光学上无可挑剔的焊缝与电功能半导体器件密切相关。封装电源模块的功率循环目前正在进行中,并将公布结果。展望了进一步改进激光键合工艺的未来措施,并讨论了激光键合与其他先进的上层互连方法的比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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