From Process Variations to Reliability: A Survey of Timing of Digital Circuits in the Nanometer Era

Q4 Engineering
Bing Li, M. Hashimoto, Ulf Schlichtmann
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引用次数: 8

Abstract

: In advanced technology nodes, transistors and interconnects with shrinking physical dimensions su ff er large process variations during manufacturing and are prone to reliability issues. These underlying changes require an overhaul of the design methodologies for digital circuits. In this paper, we provide an overview of techniques introduced recently to analyze the e ff ect of uncertainty in manufacturing and reliability issues of devices due to the diminishing feature size. These techniques range from variation / aging modeling to circuit-level analysis. In addition, active techniques to counter these e ff ects, such as clock skew tuning and voltage tuning are also covered in this paper.
从工艺变化到可靠性:纳米时代数字电路时序研究
在先进的技术节点中,物理尺寸不断缩小的晶体管和互连在制造过程中会出现较大的工艺变化,容易出现可靠性问题。这些潜在的变化需要对数字电路的设计方法进行彻底改革。在本文中,我们概述了最近引入的技术,以分析由于特征尺寸减小而导致的制造不确定性和设备可靠性问题的影响。这些技术的范围从变化/老化建模到电路级分析。此外,有源技术来对抗这些影响,如时钟倾斜调谐和电压调谐也在本文中讨论。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
IPSJ Transactions on System LSI Design Methodology
IPSJ Transactions on System LSI Design Methodology Engineering-Electrical and Electronic Engineering
CiteScore
1.20
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0.00%
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