W. Hong, J. Hayes, R. Bhat, P. Lin, C. Nguyen, H.P. Lee, D. Yang, P. Bhattacharya
{"title":"Novel pseudomorphic InP/InAs/sub 0.6/P/sub 0.4/ quantum-well HEMT's","authors":"W. Hong, J. Hayes, R. Bhat, P. Lin, C. Nguyen, H.P. Lee, D. Yang, P. Bhattacharya","doi":"10.1109/IEDM.1991.235457","DOIUrl":null,"url":null,"abstract":"The authors report the first investigation of the transport properties of a 2DEG in pseudomorphic InP/InAs/sub x/P/sub 1-x/ modulation-doped heterostructures and the device characteristics of HEMTs (high electron mobility transistors) with an InP/InAs/sub 0.6/P/sub 0.4/ quantum-well channel. The dependence of the low- and high-field transport properties on the arsenic composition (x) has been studied. The Hall mobility for x=0.6 was measured to be 6100 and 52700 cm/sup 2//V-s at 300 and 77 K, respectively. The FETs having a gate length of 0.5 mu m exhibited a maximum external transconductance of 320 mS/mm and a drain saturation current density of 705 mA/mm. The f/sub T/ and f/sub max/ were measured to be 55 and 60 GHz, respectively. The saturation electron velocity was estimated to be 2.1*10/sup 7/ cm/s. The results clearly demonstrate the great potential of these material systems for high-speed applications.<<ETX>>","PeriodicalId":13885,"journal":{"name":"International Electron Devices Meeting 1991 [Technical Digest]","volume":"67 1","pages":"243-246"},"PeriodicalIF":0.0000,"publicationDate":"1991-12-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Electron Devices Meeting 1991 [Technical Digest]","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.1991.235457","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
The authors report the first investigation of the transport properties of a 2DEG in pseudomorphic InP/InAs/sub x/P/sub 1-x/ modulation-doped heterostructures and the device characteristics of HEMTs (high electron mobility transistors) with an InP/InAs/sub 0.6/P/sub 0.4/ quantum-well channel. The dependence of the low- and high-field transport properties on the arsenic composition (x) has been studied. The Hall mobility for x=0.6 was measured to be 6100 and 52700 cm/sup 2//V-s at 300 and 77 K, respectively. The FETs having a gate length of 0.5 mu m exhibited a maximum external transconductance of 320 mS/mm and a drain saturation current density of 705 mA/mm. The f/sub T/ and f/sub max/ were measured to be 55 and 60 GHz, respectively. The saturation electron velocity was estimated to be 2.1*10/sup 7/ cm/s. The results clearly demonstrate the great potential of these material systems for high-speed applications.<>