Synthesis of Nano-Dots and Lines by Glancing Angle Deposition With Corrals

IF 1 Q4 ENGINEERING, MANUFACTURING
C. Qu, S. Mcnamara, K. Walsh
{"title":"Synthesis of Nano-Dots and Lines by Glancing Angle Deposition With Corrals","authors":"C. Qu, S. Mcnamara, K. Walsh","doi":"10.1115/msec2022-83720","DOIUrl":null,"url":null,"abstract":"\n This paper introduces using GLancing Angle Deposition (GLAD) with corral seeds for synthesizing nanodots and nanolines. GLAD is an advanced physical vapor deposition technique for creating three dimensional nanostructures. GLAD is commonly combined with pre-determined seeds on the substrate to create periodic nanofeature arrays; the seeds are usually artificial nucleation sites to rearrange the deposition patterns. However, the concept of corral seeds is different: the incident vapor will be depositing both on and inside the sacrificial layer of the corrals that consist various shapes; the desired nanostructures are grown from the overlapped deposition areas inside the corrals while the substrate rotates, depending on the shape of the corrals, and eventually will be remaining on the substrate when the sacrificial layer of the corral seeds is removed. The thickness of the sacrificial corrals along with the incident angle of the vapor define the shadow areas and deposition areas inside the corrals on the substrate. In this paper, three types of corrals are introduced: circular corrals, dumbbell corrals, and line corrals. The different nanofeatures of nanodots, limited-length nanolines and wafer-length nanolines created by different shaped corrals are presented. The fabricated nanodots and nanolines are potentially used in various optical and sensing applications. The two-step fabrication process of preparing corrals and GLAD provides numerous benefits for the synthesis of the nanofeatures.","PeriodicalId":45459,"journal":{"name":"Journal of Micro and Nano-Manufacturing","volume":null,"pages":null},"PeriodicalIF":1.0000,"publicationDate":"2022-06-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Micro and Nano-Manufacturing","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1115/msec2022-83720","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"ENGINEERING, MANUFACTURING","Score":null,"Total":0}
引用次数: 0

Abstract

This paper introduces using GLancing Angle Deposition (GLAD) with corral seeds for synthesizing nanodots and nanolines. GLAD is an advanced physical vapor deposition technique for creating three dimensional nanostructures. GLAD is commonly combined with pre-determined seeds on the substrate to create periodic nanofeature arrays; the seeds are usually artificial nucleation sites to rearrange the deposition patterns. However, the concept of corral seeds is different: the incident vapor will be depositing both on and inside the sacrificial layer of the corrals that consist various shapes; the desired nanostructures are grown from the overlapped deposition areas inside the corrals while the substrate rotates, depending on the shape of the corrals, and eventually will be remaining on the substrate when the sacrificial layer of the corral seeds is removed. The thickness of the sacrificial corrals along with the incident angle of the vapor define the shadow areas and deposition areas inside the corrals on the substrate. In this paper, three types of corrals are introduced: circular corrals, dumbbell corrals, and line corrals. The different nanofeatures of nanodots, limited-length nanolines and wafer-length nanolines created by different shaped corrals are presented. The fabricated nanodots and nanolines are potentially used in various optical and sensing applications. The two-step fabrication process of preparing corrals and GLAD provides numerous benefits for the synthesis of the nanofeatures.
用扫角沉积法合成纳米点和纳米线
本文介绍了用扫角沉积法合成纳米点和纳米线的方法。GLAD是一种先进的物理气相沉积技术,用于创建三维纳米结构。GLAD通常与衬底上预先确定的种子相结合,以创建周期性纳米特征阵列;种子通常是人工成核的场所,以重新排列沉积模式。然而,畜栏种子的概念是不同的:入射蒸汽将沉积在由各种形状组成的畜栏的牺牲层上和内部;当衬底旋转时,所需的纳米结构取决于衬底的形状,从衬底内重叠的沉积区域生长出来,最终当衬底上的牺牲层种子被移除时,纳米结构将留在衬底上。牺牲圈的厚度以及蒸气的入射角决定了在基板上的圈内的阴影区和沉积区。本文介绍了三种围栏类型:圆形围栏、哑铃围栏和线围栏。介绍了不同形状的纳米圈形成的纳米点、有限长度纳米线和晶圆长度纳米线的不同纳米特征。所制备的纳米点和纳米线在各种光学和传感领域具有潜在的应用前景。制备环和GLAD的两步制备工艺为纳米特征的合成提供了许多好处。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Journal of Micro and Nano-Manufacturing
Journal of Micro and Nano-Manufacturing ENGINEERING, MANUFACTURING-
CiteScore
2.70
自引率
0.00%
发文量
12
期刊介绍: The Journal of Micro and Nano-Manufacturing provides a forum for the rapid dissemination of original theoretical and applied research in the areas of micro- and nano-manufacturing that are related to process innovation, accuracy, and precision, throughput enhancement, material utilization, compact equipment development, environmental and life-cycle analysis, and predictive modeling of manufacturing processes with feature sizes less than one hundred micrometers. Papers addressing special needs in emerging areas, such as biomedical devices, drug manufacturing, water and energy, are also encouraged. Areas of interest including, but not limited to: Unit micro- and nano-manufacturing processes; Hybrid manufacturing processes combining bottom-up and top-down processes; Hybrid manufacturing processes utilizing various energy sources (optical, mechanical, electrical, solar, etc.) to achieve multi-scale features and resolution; High-throughput micro- and nano-manufacturing processes; Equipment development; Predictive modeling and simulation of materials and/or systems enabling point-of-need or scaled-up micro- and nano-manufacturing; Metrology at the micro- and nano-scales over large areas; Sensors and sensor integration; Design algorithms for multi-scale manufacturing; Life cycle analysis; Logistics and material handling related to micro- and nano-manufacturing.
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