Atomic layer deposition to heterostructures for application in gas sensors

IF 16.1 1区 工程技术 Q1 ENGINEERING, MANUFACTURING
Hongyin Pan, Lihao Zhou, Wei Zheng, Xianghong Liu, Jun Zhang, Nicole Pinna
{"title":"Atomic layer deposition to heterostructures for application in gas sensors","authors":"Hongyin Pan, Lihao Zhou, Wei Zheng, Xianghong Liu, Jun Zhang, Nicole Pinna","doi":"10.1088/2631-7990/acc76d","DOIUrl":null,"url":null,"abstract":"Atomic layer deposition (ALD) is a versatile technique to deposit metals and metal oxide sensing materials at the atomic scale to achieve improved sensor functions. This article reviews metals and metal oxide semiconductor (MOS) heterostructures for gas sensing applications in which at least one of the preparation steps is carried out by ALD. In particular, three types of MOS-based heterostructures synthesized by ALD are discussed, including ALD of metal catalysts on MOS, ALD of metal oxides on MOS and MOS core–shell (C–S) heterostructures. The gas sensing performances of these heterostructures are carefully analyzed and discussed. Finally, the further developments required and the challenges faced by ALD for the synthesis of MOS gas sensing materials are discussed.","PeriodicalId":52353,"journal":{"name":"International Journal of Extreme Manufacturing","volume":"90 1","pages":""},"PeriodicalIF":16.1000,"publicationDate":"2023-03-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Journal of Extreme Manufacturing","FirstCategoryId":"5","ListUrlMain":"https://doi.org/10.1088/2631-7990/acc76d","RegionNum":1,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"ENGINEERING, MANUFACTURING","Score":null,"Total":0}
引用次数: 6

Abstract

Atomic layer deposition (ALD) is a versatile technique to deposit metals and metal oxide sensing materials at the atomic scale to achieve improved sensor functions. This article reviews metals and metal oxide semiconductor (MOS) heterostructures for gas sensing applications in which at least one of the preparation steps is carried out by ALD. In particular, three types of MOS-based heterostructures synthesized by ALD are discussed, including ALD of metal catalysts on MOS, ALD of metal oxides on MOS and MOS core–shell (C–S) heterostructures. The gas sensing performances of these heterostructures are carefully analyzed and discussed. Finally, the further developments required and the challenges faced by ALD for the synthesis of MOS gas sensing materials are discussed.
异质结构原子层沉积在气体传感器中的应用
原子层沉积(ALD)是一种在原子尺度上沉积金属和金属氧化物传感材料以实现改进传感器功能的通用技术。本文综述了用于气敏应用的金属和金属氧化物半导体(MOS)异质结构,其中至少有一个制备步骤是由ALD进行的。重点讨论了ALD合成的三种基于MOS的异质结构,包括金属催化剂在MOS上的ALD、金属氧化物在MOS上的ALD和MOS核壳(C-S)异质结构。对这些异质结构的气敏性能进行了详细的分析和讨论。最后,讨论了ALD在合成MOS气敏材料方面的进一步发展和面临的挑战。
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来源期刊
International Journal of Extreme Manufacturing
International Journal of Extreme Manufacturing Engineering-Industrial and Manufacturing Engineering
CiteScore
17.70
自引率
6.10%
发文量
83
审稿时长
12 weeks
期刊介绍: The International Journal of Extreme Manufacturing (IJEM) focuses on publishing original articles and reviews related to the science and technology of manufacturing functional devices and systems with extreme dimensions and/or extreme functionalities. The journal covers a wide range of topics, from fundamental science to cutting-edge technologies that push the boundaries of currently known theories, methods, scales, environments, and performance. Extreme manufacturing encompasses various aspects such as manufacturing with extremely high energy density, ultrahigh precision, extremely small spatial and temporal scales, extremely intensive fields, and giant systems with extreme complexity and several factors. It encompasses multiple disciplines, including machinery, materials, optics, physics, chemistry, mechanics, and mathematics. The journal is interested in theories, processes, metrology, characterization, equipment, conditions, and system integration in extreme manufacturing. Additionally, it covers materials, structures, and devices with extreme functionalities.
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