Conduction in silicon oxide films

British Journal of Applied Physics Pub Date : 1967-11-01 DOI:10.1088/0508-3443/18/11/418

M. Stuart

引用次数: 39

Abstract

The current-voltage behaviour of evaporated silicon oxide films has been investigated. It is shown that conduction is bulk limited and closely obeys a modified Poole-Frenkel equation. This equation is derived from a model of the insulator containing donors and traps.

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氧化硅薄膜中的导电

研究了蒸发氧化硅薄膜的电流-电压行为。结果表明，导电是体积受限的，并严格服从修正的Poole-Frenkel方程。这个方程是从包含供体和陷阱的绝缘体模型推导出来的。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

British Journal of Applied Physics

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