Toward Long-coherence-time Si Spin Qubit: The Origin of Low-frequency Noise in Cryo-CMOS

H. Oka, T. Matsukawa, K. Kato, S. Iizuka, W. Mizubayashi, K. Endo, T. Yasuda, T. Mori
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引用次数: 12

Abstract

We have experimentally clarified the origin of low-frequency noise, which limits the coherence-time in Si quantum bit (qubit), utilizing cryo-CMOS. At cryogenic temperature (2.5 K), significantly enhanced $1/f$ noise is observed in Si MOSFETs, while it is not seen at room temperature. Interface trap density dependence of noise in Si MOSFETs, changing the surface orientation, revealed that the cryogenic $1/f$ noise is governed by carrier number fluctuation and we identified that the origin of the $1/f\mathrm{noise}$ is interface trap at cryogenic temperature, for the first time. The present study demonstrates that the experiments using well-investigated MOSFETs can provide new knowledge on Si qubits, which it is hardly possible to investigate using Si qubit as itself.
走向长相干时间Si自旋量子位:低温cmos中低频噪声的来源
我们利用cryo-CMOS通过实验澄清了限制Si量子比特(量子位)相干时间的低频噪声的来源。在低温(2.5 K)下,在Si mosfet中观察到显著增强的$1/f$噪声,而在室温下则没有观察到。界面阱密度对Si mosfet表面取向的依赖性揭示了低温1/f噪声受载流子数波动的控制,并首次确定了低温下1/f噪声的来源是界面阱。本研究表明,利用充分研究的mosfet进行实验可以提供关于Si量子比特的新知识,而使用Si量子比特本身几乎不可能进行研究。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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