Emerging 2D materials for tunneling field effect transistors

IF 0.1 Q4 MULTIDISCIPLINARY SCIENCES
Nupur Navlakha, Leonard F. Register, Sanjay K. Banerjee
{"title":"Emerging 2D materials for tunneling field effect transistors","authors":"Nupur Navlakha, Leonard F. Register, Sanjay K. Banerjee","doi":"10.18845/tm.v36i6.6768","DOIUrl":null,"url":null,"abstract":"This work focuses on understanding the electronic properties of materials to enhance the performance of Tunnel Field Effect Transistor (TFET) through Density Functional Theory (DFT) simulations. Material selection prefers a p-type material with in-plane high density of state (DOS) (and low out-of-plane effective mass, m*, where defined for many layer systems), and high valence band maxima (VBM) energy stacked with an n-type material with low conduction band minimum (CBM) energy (large electron affinity (EA)) that creates a broken or nearly broken band alignment and has low lattice mismatch. SnSe2 is well-suited for an n-type 2D material due to high EA, while WSe2, Black phosphorous (BP) and SnSe are explored for p-type materials. Bilayers consisting of monolayers of WSe2 and SnSe2 show a staggered but nearly broken band alignment (gap of 24 meV) and a high valence band DOS for WSe2. BP-SnSe2 shows a broken band alignment and benefits from a low lattice mismatch. SnSe-SnSe2 shows the highest chemical stability, an optimal performance in terms of DOS of SnSe, tunability with an external field, and high VBM that also leads to a broken band alignment.","PeriodicalId":42957,"journal":{"name":"Tecnologia en Marcha","volume":"89 1","pages":""},"PeriodicalIF":0.1000,"publicationDate":"2023-06-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Tecnologia en Marcha","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.18845/tm.v36i6.6768","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"MULTIDISCIPLINARY SCIENCES","Score":null,"Total":0}
引用次数: 0

Abstract

This work focuses on understanding the electronic properties of materials to enhance the performance of Tunnel Field Effect Transistor (TFET) through Density Functional Theory (DFT) simulations. Material selection prefers a p-type material with in-plane high density of state (DOS) (and low out-of-plane effective mass, m*, where defined for many layer systems), and high valence band maxima (VBM) energy stacked with an n-type material with low conduction band minimum (CBM) energy (large electron affinity (EA)) that creates a broken or nearly broken band alignment and has low lattice mismatch. SnSe2 is well-suited for an n-type 2D material due to high EA, while WSe2, Black phosphorous (BP) and SnSe are explored for p-type materials. Bilayers consisting of monolayers of WSe2 and SnSe2 show a staggered but nearly broken band alignment (gap of 24 meV) and a high valence band DOS for WSe2. BP-SnSe2 shows a broken band alignment and benefits from a low lattice mismatch. SnSe-SnSe2 shows the highest chemical stability, an optimal performance in terms of DOS of SnSe, tunability with an external field, and high VBM that also leads to a broken band alignment.
用于隧道场效应晶体管的新兴二维材料
本工作的重点是通过密度泛函理论(DFT)模拟来了解材料的电子特性,以提高隧道场效应晶体管(ttfet)的性能。材料选择更倾向于具有面内高密度态(DOS)的p型材料(以及低面外有效质量,m*,其中定义为许多层系统),以及高价带最大值(VBM)能量与具有低导带最小值(CBM)能量(大电子亲和(EA))的n型材料堆叠,从而产生断裂或几乎断裂的带对齐并具有低晶格错配。SnSe2由于EA高,适合用于n型二维材料,而WSe2、黑磷(BP)和SnSe则适合用于p型材料。由单层WSe2和SnSe2组成的双层膜显示出交错但几乎断裂的能带排列(间隙为24 meV)和WSe2的高价带DOS。BP-SnSe2显示出破碎的带对准,并受益于低晶格错配。SnSe- snse2具有最高的化学稳定性,SnSe的DOS性能最佳,外场可调性最佳,高VBM也导致带对准断裂。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Tecnologia en Marcha
Tecnologia en Marcha MULTIDISCIPLINARY SCIENCES-
自引率
0.00%
发文量
93
审稿时长
28 weeks
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