N. Yutani, H. Yagi, M. Kimata, J. Nakanishi, S. Nagayoshi, N. Tubouchi
{"title":"1040*1040 element PtSi Schottky-barrier IR image sensor","authors":"N. Yutani, H. Yagi, M. Kimata, J. Nakanishi, S. Nagayoshi, N. Tubouchi","doi":"10.1109/IEDM.1991.235473","DOIUrl":null,"url":null,"abstract":"A high-density infrared image sensor has been developed for thermal imaging in the 3-5 mu m infrared band. The array size is 1040*1040. The detector is a platinum silicide (PtSi) Schottky-barrier diode. The charge sweep device (CSD) architecture is used for the device in order to realize a large fill factor and a high saturation level. The device is fabricated with a 1.5 mu m minimum feature size and has a large fill factor of 53% in spite of the small pixel size (17*17 mu m/sup 2/). The saturation level is improved by increasing the detector storage capacity. A high saturation level of 1.6*10/sup 6/ electrons is obtained. The noise equivalent temperature difference with f/1.2 optics is estimated as 0.10 K at 300 K.<<ETX>>","PeriodicalId":13885,"journal":{"name":"International Electron Devices Meeting 1991 [Technical Digest]","volume":"6 1","pages":"175-178"},"PeriodicalIF":0.0000,"publicationDate":"1991-12-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"23","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Electron Devices Meeting 1991 [Technical Digest]","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.1991.235473","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 23
Abstract
A high-density infrared image sensor has been developed for thermal imaging in the 3-5 mu m infrared band. The array size is 1040*1040. The detector is a platinum silicide (PtSi) Schottky-barrier diode. The charge sweep device (CSD) architecture is used for the device in order to realize a large fill factor and a high saturation level. The device is fabricated with a 1.5 mu m minimum feature size and has a large fill factor of 53% in spite of the small pixel size (17*17 mu m/sup 2/). The saturation level is improved by increasing the detector storage capacity. A high saturation level of 1.6*10/sup 6/ electrons is obtained. The noise equivalent temperature difference with f/1.2 optics is estimated as 0.10 K at 300 K.<>