{"title":"Double Injection Diodes and Related DI Phenomena in Semiconductors","authors":"N. Holonyak","doi":"10.1109/JRPROC.1962.288258","DOIUrl":null,"url":null,"abstract":"Experimental studies of double injection (DI) negative resistance phenomena in GaAs, Si, and Ge are presented. V-I characteristics, switching, trapping, and photosensitivity properties of GaAs DI p-i-n diodes, fabricated by diffusion and alloying processes on semi-insulating crystals and in other cases fabricated via epitaxial processes with Cu-doped i regions, are described. Similar studies and data are presented on Si DI p-i-n diodes prepared via diffusion and/or alloying processes. Silicon DI p-i-n diodes are described which have been doped with various deep level impurities such as Au, Zn, Cd, or Co and which, depending upon the kind and concentration of deep level impurities, display a wide range of behavior including useful photosensitivity, switching, and voltage regulation properties. Brief mention is made of Ge DI p-i-n diodes fabricated on n-type crystals counter-doped with Cu, Fe, Ni, Co, or Mn. A comparison is made between experimental results and current theories of double injection effects. As might be expected, existing theories do not completely account for the experimental situation, e.g., breakdown to constant voltage in certain units and phenomena which seem closely related to plasma effects. In addition to various practical implications, including possibilities for a noninteracting diode negative resistance matrix, low voltage regulator diodes, photosensitive charge-storage diodes, and higher power microwave switching p-i-n diodes, the significance of deep level doping and possible and actual effects (e.g., secondary switching effects) on epitaxial Si devices are described.","PeriodicalId":20574,"journal":{"name":"Proceedings of the IRE","volume":"31 1","pages":"2421-2428"},"PeriodicalIF":0.0000,"publicationDate":"1962-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"65","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the IRE","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/JRPROC.1962.288258","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 65
Abstract
Experimental studies of double injection (DI) negative resistance phenomena in GaAs, Si, and Ge are presented. V-I characteristics, switching, trapping, and photosensitivity properties of GaAs DI p-i-n diodes, fabricated by diffusion and alloying processes on semi-insulating crystals and in other cases fabricated via epitaxial processes with Cu-doped i regions, are described. Similar studies and data are presented on Si DI p-i-n diodes prepared via diffusion and/or alloying processes. Silicon DI p-i-n diodes are described which have been doped with various deep level impurities such as Au, Zn, Cd, or Co and which, depending upon the kind and concentration of deep level impurities, display a wide range of behavior including useful photosensitivity, switching, and voltage regulation properties. Brief mention is made of Ge DI p-i-n diodes fabricated on n-type crystals counter-doped with Cu, Fe, Ni, Co, or Mn. A comparison is made between experimental results and current theories of double injection effects. As might be expected, existing theories do not completely account for the experimental situation, e.g., breakdown to constant voltage in certain units and phenomena which seem closely related to plasma effects. In addition to various practical implications, including possibilities for a noninteracting diode negative resistance matrix, low voltage regulator diodes, photosensitive charge-storage diodes, and higher power microwave switching p-i-n diodes, the significance of deep level doping and possible and actual effects (e.g., secondary switching effects) on epitaxial Si devices are described.
对砷化镓(GaAs)、硅(Si)和锗(Ge)中双注入(DI)负电阻现象进行了实验研究。本文描述了在半绝缘晶体上通过扩散和合金化工艺制备的GaAs DI p-i-n二极管的V-I特性、开关、捕获和光敏性能,以及在其他情况下通过带cu掺杂i区的外延工艺制备的GaAs DI p-i-n二极管。通过扩散和/或合金化工艺制备的Si - DI - p-i-n二极管也有类似的研究和数据。本文描述了硅DI p-i-n二极管,其中掺杂了各种深能级杂质,如Au, Zn, Cd或Co,并且根据深能级杂质的种类和浓度,显示出广泛的行为,包括有用的光敏性,开关和电压调节特性。简要地提到了用Cu, Fe, Ni, Co或Mn反掺杂的n型晶体制造的Ge DI p-i-n二极管。对双注入效应的实验结果与现有理论进行了比较。正如可以预料的那样,现有的理论并不能完全解释实验情况,例如,在某些单元中击穿到恒电压,以及似乎与等离子体效应密切相关的现象。除了各种实际意义之外,包括非相互作用二极管负电阻矩阵、低压稳压二极管、光敏电荷存储二极管和更高功率微波开关p-i-n二极管的可能性,还描述了深能级掺杂的重要性以及对外延硅器件可能的和实际的影响(例如,二次开关效应)。