Synthesis of Au:TiO2 Nanoparticles via Laser Ablation in Liquid Deposited on Porous-Si for Improved Spectral Responsivity

E. Suliman, Uday M. Nayef, F. Mutlak
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引用次数: 1

Abstract

In this study, Au:TiO 2 nanoparticles (NPs) are prepared by using the laser ablation method in liquid at different laser energies (600, 800, and1000 mJ). After that, Au: TiO 2 NPs were deposited on porous-Si(PS). Porous silicon (PS) is synthesized by using the photoelectrochemical etching (PECE) of n-type crystalline Si (c-Si) wafers of (100) orientation. The intensity of the etching current density was (4, 12, and 20 mA/cm 2 ), with 16% (HF), and the etching time was 15 minutes. The X-ray diffraction (XRD) techniques, scanning electron microscopy (SEM), UV–visible spectrophotometry, and electrical properties are used to characterize the obtained particles. From the photo-detector measurements, the spectral responsivity curves three inclusive regions; the first peak was due to the absorption of UV light by Au: TiO 2 NPs. The second peak was corresponding to the visible light absorption with the PS layer and the third peak was due to the absorption edge of the Si substrate. The higher responsivity of Au: TiO 2 NPs/PS photo-detector was found to be 2.56A/W for specimens prepared at laser energy 800mJ.
激光烧蚀法制备Au:TiO2纳米颗粒以提高光谱响应率
在本研究中,采用激光烧蚀法在不同激光能量(600、800和1000 mJ)的液体中制备了Au: tio2纳米颗粒(NPs)。然后在多孔si (PS)上沉积Au: tio2 NPs。采用(100)取向n型晶硅(c-Si)晶圆的光电腐蚀(PECE)技术合成了多孔硅(PS)。刻蚀电流密度分别为(4、12、20 mA/ cm2), HF为16%,刻蚀时间为15 min。利用x射线衍射(XRD)技术、扫描电子显微镜(SEM)、紫外可见分光光度法和电学性能对所得颗粒进行表征。从光电探测器测量,光谱响应曲线三个包含区域;第一个峰是Au: TiO 2 NPs对紫外光的吸收。第二个峰对应于PS层对可见光的吸收,第三个峰对应于Si衬底的吸收边。在激光能量为800mJ时制备的Au: tio2 NPs/PS光电探测器的响应率最高,为2.56A/W。
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