Changes in mechanical properties of micron-sized single-crystal-silicon film at high temperature

S. Nakao, T. Ando, M. Shikida, K. Sato
{"title":"Changes in mechanical properties of micron-sized single-crystal-silicon film at high temperature","authors":"S. Nakao, T. Ando, M. Shikida, K. Sato","doi":"10.1109/SENSOR.2005.1497484","DOIUrl":null,"url":null,"abstract":"The effects of temperature on the mechanical properties of micron-sized single-crystal-silicon (SCS) film were investigated using an \"on-chip\" tensile test. Young's modulus slightly decreased as the test temperature increased. The fracture stress decreased to 1.78 GPa at 773 K, the value is about 32 % of that at room temperature. The stress-strain relationship of SCS film at 773 K showed elastic-plastic deformation, and we observed crossed slip lines on the side surface of the fractured specimen. The fracture behavior of micron-sized silicon film changed in a temperature range from 673 K to 773 K.","PeriodicalId":22359,"journal":{"name":"The 13th International Conference on Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05.","volume":"7 1","pages":"1961-1964 Vol. 2"},"PeriodicalIF":0.0000,"publicationDate":"2005-06-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"The 13th International Conference on Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SENSOR.2005.1497484","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3

Abstract

The effects of temperature on the mechanical properties of micron-sized single-crystal-silicon (SCS) film were investigated using an "on-chip" tensile test. Young's modulus slightly decreased as the test temperature increased. The fracture stress decreased to 1.78 GPa at 773 K, the value is about 32 % of that at room temperature. The stress-strain relationship of SCS film at 773 K showed elastic-plastic deformation, and we observed crossed slip lines on the side surface of the fractured specimen. The fracture behavior of micron-sized silicon film changed in a temperature range from 673 K to 773 K.
微米单晶硅薄膜在高温下力学性能的变化
采用片上拉伸试验研究了温度对微米单晶硅薄膜力学性能的影响。随着试验温度的升高,杨氏模量略有下降。在773 K时,断裂应力降至1.78 GPa,约为室温时的32%。在773 K时,SCS薄膜的应力-应变关系表现为弹塑性变形,并且在断裂试样的侧面观察到交叉滑移线。在673 ~ 773 K温度范围内,微米级硅膜的断裂行为发生了变化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信