Liang Zhang, Haiyang Zhan, Yuhang Xia, Renwei Zhang, Juncheng Xue, Jiahao Yong, Lei Zhao, Yahua Liu and Shile Feng*,
{"title":"Efficient Passive Daytime Radiative Cooling by Hierarchically Designed Films Integrating Robust Durability","authors":"Liang Zhang, Haiyang Zhan, Yuhang Xia, Renwei Zhang, Juncheng Xue, Jiahao Yong, Lei Zhao, Yahua Liu and Shile Feng*, ","doi":"10.1021/acsami.3c05327","DOIUrl":null,"url":null,"abstract":"<p >Surfaces with efficient passive daytime radiative cooling (PDRC) are underpinned by maximizing both solar reflection and thermal radiation to the outer space at no additional energy cost. Despite notable progress, their practical applications are of great challenge due to their complicated fabrication processes, easy contamination and damage, and high costs. Herein, we fabricate a hierarchically designed passive daytime radiative cooling film (HPRF) comprising cost-effective Al<sub>2</sub>O<sub>3</sub> particles and poly(dimethylsiloxane) (PDMS) via a simple phase separation method. The designed film possesses a high solar spectrum reflectance of ~0.96 and a mid-infrared emittance of ~0.95, achieving a ~12.4 °C subambient cooling under direct solar irradiation. This excellent PDRC is due to the efficient Mie scattering of sunlight by hierarchical micro-/nanostructures and selected molecular vibrations of PDMS combined with the phonon polariton resonance of Al<sub>2</sub>O<sub>3</sub> particles, respectively. Moreover, the designed HPRF is accompanied with robust durability endowed by superior self-cleaning, flexibility, and anti-ultraviolet radiation that can present substantial application promises of thermal management in various electronic devices and wearable products.</p>","PeriodicalId":5,"journal":{"name":"ACS Applied Materials & Interfaces","volume":"15 26","pages":"31994–32001"},"PeriodicalIF":8.2000,"publicationDate":"2023-06-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Applied Materials & Interfaces","FirstCategoryId":"88","ListUrlMain":"https://pubs.acs.org/doi/10.1021/acsami.3c05327","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
Surfaces with efficient passive daytime radiative cooling (PDRC) are underpinned by maximizing both solar reflection and thermal radiation to the outer space at no additional energy cost. Despite notable progress, their practical applications are of great challenge due to their complicated fabrication processes, easy contamination and damage, and high costs. Herein, we fabricate a hierarchically designed passive daytime radiative cooling film (HPRF) comprising cost-effective Al2O3 particles and poly(dimethylsiloxane) (PDMS) via a simple phase separation method. The designed film possesses a high solar spectrum reflectance of ~0.96 and a mid-infrared emittance of ~0.95, achieving a ~12.4 °C subambient cooling under direct solar irradiation. This excellent PDRC is due to the efficient Mie scattering of sunlight by hierarchical micro-/nanostructures and selected molecular vibrations of PDMS combined with the phonon polariton resonance of Al2O3 particles, respectively. Moreover, the designed HPRF is accompanied with robust durability endowed by superior self-cleaning, flexibility, and anti-ultraviolet radiation that can present substantial application promises of thermal management in various electronic devices and wearable products.
期刊介绍:
ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.