Improved intermodulation distortion profile of AlGaN/GaN HEMT at high drain bias voltage

M. Nagahara, T. Kikkawa, N. Adachi, Y. Tateno, S. Kato, M. Yokoyama, S. Yokogawa, T. Kimura, Y. Yamaguchi, N. Hara, K. Joshin
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引用次数: 18

Abstract

We demonstrate, for the first time, the excellent linearity characteristics of AlGaN/GaN HEMTs at drain bias voltages up to 30 V, class AB operation, at 1.9 GHz. AlGaN/GaN HEMTs with a drain periphery of 1 mm, grown on SiC substrates, exhibit a third-order intermodulation distortion (IM3) of -34.7 dBc for an output power level of 26 dBm, 8 dB back-off from saturation power (Psat), at drain bias voltage of 30 V. Furthermore, we will show the linearity characteristics dependence on Vds and describe that superior linearity profile can be obtained with AlGaN/GaN HEMTs at high drain voltage bias.
高漏偏置电压下AlGaN/GaN HEMT互调畸变谱的改进
我们首次证明了AlGaN/GaN hemt在漏极偏置电压高达30 V、AB类工作、1.9 GHz时的良好线性特性。在SiC衬底上生长的漏极周边为1 mm的AlGaN/GaN hemt,在漏极偏置电压为30 V时,输出功率为26 dBm,与饱和功率(Psat)相差8 dB时,其三阶互调失真(IM3)为-34.7 dBc。此外,我们将展示线性特性与Vds的关系,并描述在高漏极偏压下使用AlGaN/GaN hemt可以获得优异的线性特性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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