CPI challenges in advanced Si technology nodes

C. S. Liu, H. Pu, C. S. Chen, H. Tsai, C. Lee, M. Lii, Doug C. H. Yu
{"title":"CPI challenges in advanced Si technology nodes","authors":"C. S. Liu, H. Pu, C. S. Chen, H. Tsai, C. Lee, M. Lii, Doug C. H. Yu","doi":"10.1109/IITC.2013.6615559","DOIUrl":null,"url":null,"abstract":"The key chip-package-integration (CPI) challenges and solutions in the packaging and assembly of advanced Si technology nodes are reported. The key challenge of CPI due to the use of fragile extreme low-k (ELK) dielectric materials in the back-end-of-line (BEOL) layer has been resolved by optimizing bump structure and materials set including both the organic substrate and solder materials, along with process improvements for both Pb-free solder and Cu bump in flip chip packages.","PeriodicalId":6377,"journal":{"name":"2013 IEEE International Interconnect Technology Conference - IITC","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2013-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 IEEE International Interconnect Technology Conference - IITC","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IITC.2013.6615559","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

The key chip-package-integration (CPI) challenges and solutions in the packaging and assembly of advanced Si technology nodes are reported. The key challenge of CPI due to the use of fragile extreme low-k (ELK) dielectric materials in the back-end-of-line (BEOL) layer has been resolved by optimizing bump structure and materials set including both the organic substrate and solder materials, along with process improvements for both Pb-free solder and Cu bump in flip chip packages.
CPI在先进Si技术节点的挑战
报告了先进硅技术节点封装和组装过程中所面临的关键芯片封装集成(CPI)挑战和解决方案。由于在后端线(BEOL)层中使用脆弱的极低k (ELK)介电材料,CPI的主要挑战已经通过优化凸点结构和材料集(包括有机衬底和焊料材料)以及对倒装芯片封装中的无铅焊料和铜凸点的工艺改进来解决。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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