J. Wetzel, S.H. Lin, E. Mickler, J. Lee, B. Ahlbum, C. Jin, R. Fox, M. Tsai, W. Mlynko, K. Monnig, P. Winebarger
{"title":"Evaluation of material property requirements and performance of ultra-low dielectric constant insulators for inlaid copper metallization","authors":"J. Wetzel, S.H. Lin, E. Mickler, J. Lee, B. Ahlbum, C. Jin, R. Fox, M. Tsai, W. Mlynko, K. Monnig, P. Winebarger","doi":"10.1109/IEDM.2001.979406","DOIUrl":null,"url":null,"abstract":"Technological challenges for selection and integration of ultra-low dielectric constant insulators are discussed. Correlations of material properties with their performance in 1 level-metal inlaid copper integration are established. Dielectric constants of candidate materials are estimated from line-to-line capacitance measurements and FEM. Implications regarding the changes in dielectric constant are discussed.","PeriodicalId":13825,"journal":{"name":"International Electron Devices Meeting. Technical Digest (Cat. No.01CH37224)","volume":"26 1","pages":"4.1.1-4.1.3"},"PeriodicalIF":0.0000,"publicationDate":"2001-12-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Electron Devices Meeting. Technical Digest (Cat. No.01CH37224)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.2001.979406","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5
Abstract
Technological challenges for selection and integration of ultra-low dielectric constant insulators are discussed. Correlations of material properties with their performance in 1 level-metal inlaid copper integration are established. Dielectric constants of candidate materials are estimated from line-to-line capacitance measurements and FEM. Implications regarding the changes in dielectric constant are discussed.