SURFACE PROPERTIES OF FLUOROCARBON COATINGS PRODUCED BY LOW-FREQUENCY PLASMATRON AT ATMOSPHERIC PRESSURE

IF 1.6 4区材料科学 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY

High Temperature Materials and Processes Pub Date : 2023-01-01 DOI:10.1615/hightempmatproc.v27.i3.50

A. Shvedov, V. Elinson, P. Shchur

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Abstract

This paper presents the results of studies conducted on coatings based on thin fluorocarbon films obtained by plasma-enhanced chemical vapor deposition using low-frequency plasmatron and low-temperature plasma at atmospheric pressure. The possibility of forming thin fluorocarbon layers by supplying a cyclohexane/carbon tetrafluoride gas mixture to substrates made of polymeric materials (polyethylene terephthalate and polystyrene) has been demonstrated and the main technological modes of deposition process have been established. The absorption spectra of the obtained coatings were studied, the influence of the gas discharge energy contribution on the concentration of fluorocarbon compounds was established, and the band gap was calculated using the Tauc method. The surface relief of the obtained structures was considered using atomic force microscopy and the root-mean-square deviation of the surface roughness was calculated, which reached a maximum of 36 ± 3 nm. Using the Oliver-Pharr method, the nanohardness and Young's modulus of elasticity of the obtained coatings were calculated, which amounted to 0.447 ± 0.025 and 6.10 ± 0.39 GPa, respectively.

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常压下低频等离子体制备氟碳涂料的表面性能

本文介绍了利用低频等离子体和低温等离子体在常压下进行等离子体增强化学气相沉积得到的氟碳薄膜涂层的研究结果。通过向聚合物材料(聚对苯二甲酸乙二醇酯和聚苯乙烯)制成的衬底提供环己烷/四氟化碳气体混合物，证明了形成薄氟碳层的可能性，并确定了沉积工艺的主要工艺模式。研究了所得涂层的吸收光谱，确定了气体放电能量贡献对氟碳化合物浓度的影响，并用Tauc法计算了带隙。利用原子力显微镜分析了所得结构的表面起伏度，计算了表面粗糙度的均方根偏差，其最大值为36±3 nm。采用Oliver-Pharr法计算得到的涂层的纳米硬度和杨氏弹性模量分别为0.447±0.025和6.10±0.39 GPa。

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来源期刊

High Temperature Materials and Processes 工程技术-材料科学：综合

CiteScore

2.50

自引率

0.00%

发文量

审稿时长

3.9 months

期刊介绍： High Temperature Materials and Processes offers an international publication forum for new ideas, insights and results related to high-temperature materials and processes in science and technology. The journal publishes original research papers and short communications addressing topics at the forefront of high-temperature materials research including processing of various materials at high temperatures. Occasionally, reviews of a specific topic are included. The journal also publishes special issues featuring ongoing research programs as well as symposia of high-temperature materials and processes, and other related research activities. Emphasis is placed on the multi-disciplinary nature of high-temperature materials and processes for various materials in a variety of states. Such a nature of the journal will help readers who wish to become acquainted with related subjects by obtaining information of various aspects of high-temperature materials research. The increasing spread of information on these subjects will also help to shed light on relevant topics of high-temperature materials and processes outside of readers’ own core specialties.