Synthesis and characterization of nanoscaled solder material

A. Novikov, M. Nowottnick
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Abstract

A new concept based on the usage of ultra thin films as solder material will be presented here. For this purpose nanoscaled solder films of pure tin with the maximal thickness 100 nm were synthesized through physical vapor deposition method and then characterized with high resolution methods of scanning electron microscopy and atomic force microscopy. For the protection from oxidation during phase change analysis and also during storage and soldering process silicon nitride and carbon were sputtered in the same process chamber. The function of these coatings was tested through x-ray diffraction. The crystalline film under protective layer after cooling down is a sign for impermeability of oxygen. The thermodynamic properties like melting point and undercooling were researched with the sophisticated method of chip calorimetry that allows the measurements at very fast heating and cooling rates and therefore very small amounts of material can be studied. In the first soldering experiments passivation coatings were also tested on their convenience to produce a stable solder joint. Very promising solution for the production of stable solder joints was seen on the system consisting of alternating nanoscaled metal layers, which react during soldering process by building of an alloy. One of the components of such reactive solder systems has to serve for passivation at the same time. Carrier foil with the sputtered solder structures on its both sides can noticeably improve the stability of solder joint. After assembling at low temperature the solder structures transform into diffusion zone and the main physical properties like electrical and thermal conductivity and mechanical strength of the final solder joint are determined by the properties of the carrier foil. In this work such system consisting of silver carrier foil with nanoscaled solder layers of tin and gold was successfully tested.
纳米钎料的合成与表征
本文将介绍一种基于超薄薄膜作为焊料的新概念。为此,采用物理气相沉积法合成了最大厚度为100 nm的纯锡纳米焊料膜,并用高分辨率扫描电镜和原子力显微镜对其进行了表征。为了在相变分析、储存和焊接过程中防止氧化,氮化硅和碳在同一个工艺室中溅射。通过x射线衍射测试了这些涂层的性能。冷却后保护层下的结晶膜是氧气不渗透的标志。热力学性质,如熔点和过冷用芯片量热法的复杂方法进行了研究,允许测量在非常快的加热和冷却速度,因此非常少量的材料可以研究。在第一次焊接实验中,还测试了钝化涂层是否易于产生稳定的焊点。在由交替的纳米级金属层组成的系统上,可以看到生产稳定焊点的非常有前途的解决方案,这些金属层在焊接过程中通过构建合金发生反应。这种反应性焊料系统的一个组成部分必须同时起到钝化作用。两侧有溅射焊料结构的载体箔可以明显提高焊点的稳定性。在低温下组装后,焊料结构转变为扩散区,最终焊点的电导率、导热率和机械强度等主要物理性能由载体箔的性能决定。本文成功地测试了这种由银载体箔和纳米锡金焊料层组成的系统。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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