Ferroelectricity in Rare-Earth Modified Hafnia Thin Films Deposited by Sequential Pulsed Laser Deposition

Y. Sharma, D. Barrionuevo, Radhe Agarwal, S. Pavunny, R. Katiyar
{"title":"Ferroelectricity in Rare-Earth Modified Hafnia Thin Films Deposited by Sequential Pulsed Laser Deposition","authors":"Y. Sharma, D. Barrionuevo, Radhe Agarwal, S. Pavunny, R. Katiyar","doi":"10.1149/2.0031511SSL","DOIUrl":null,"url":null,"abstract":"Room temperature ferroelectricity in pulsed laser deposited rare-earth doped hafnium oxide (HfO2) thin films is discussed. Maximum values of remnant polarizations (Pr) ~13.5 and 12 μC/cm2 along with coercive fields (EC) ~334 and 384 kV/cm are observed in 6 mol. % of rare-earth (Sm or Gd) doped-HfO2 thin films (Sm:HfO2 and Gd:HfO2), respectively. Piezoresponse force microscopy measurements confirmed ferroelectric nature of films by showing phase hysteresis and butterfly amplitude loops. It is noticed that wake-up cycles improved the remnant polarization and found to be necessary for the forming of well saturated hysteresis loops. Our results showed potential toward realization of future highly scaled non-volatile ferroelectric memories.","PeriodicalId":11423,"journal":{"name":"ECS Solid State Letters","volume":"84 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2015-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"16","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ECS Solid State Letters","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1149/2.0031511SSL","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 16

Abstract

Room temperature ferroelectricity in pulsed laser deposited rare-earth doped hafnium oxide (HfO2) thin films is discussed. Maximum values of remnant polarizations (Pr) ~13.5 and 12 μC/cm2 along with coercive fields (EC) ~334 and 384 kV/cm are observed in 6 mol. % of rare-earth (Sm or Gd) doped-HfO2 thin films (Sm:HfO2 and Gd:HfO2), respectively. Piezoresponse force microscopy measurements confirmed ferroelectric nature of films by showing phase hysteresis and butterfly amplitude loops. It is noticed that wake-up cycles improved the remnant polarization and found to be necessary for the forming of well saturated hysteresis loops. Our results showed potential toward realization of future highly scaled non-volatile ferroelectric memories.
顺序脉冲激光沉积稀土修饰铪薄膜中的铁电性
讨论了脉冲激光沉积稀土掺杂氧化铪(HfO2)薄膜的室温铁电性。在6 mol. %的稀土(Sm或Gd)掺杂HfO2薄膜(Sm:HfO2和Gd:HfO2)中,残余极化最大值(Pr)分别为13.5 μC/cm2和12 μC/cm2,外加矫顽力场(EC)分别为334和384 kV/cm。压电响应力显微镜测量通过显示相位滞后和蝶形振幅环路证实了薄膜的铁电性质。注意到唤醒周期改善了残余极化,并且发现它是形成良好饱和迟滞回路所必需的。我们的研究结果显示了实现未来高尺度非易失性铁电存储器的潜力。
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来源期刊
ECS Solid State Letters
ECS Solid State Letters MATERIALS SCIENCE, MULTIDISCIPLINARY-PHYSICS, APPLIED
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