Development of compact gas cluster ion beam (GCIB) equipment and ultra-surface smoothing

K. Hanazono, K. Tokiguchi, I. Kataoka
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引用次数: 1

Abstract

GCIB technology has been used for semiconductor, optical and magnetic device fabrications. It has also shown a possibility for nanometer level manufacturing. In recent requirement in materials processing, surface smoothing becomes important in a range of nanometer accuracy. This paper describes development of compact GCIB equipment for surface smoothing of lens molds and cutting tools. For the surface smoothing of WC lens mold and CVD diamond cutting tool, the roughness (Ra) of less than 1 nm has been achieved in a production scale. It has also been shown that the GCIB process could make the smoothing smaller than the grain size in these materials.
紧凑型气体簇离子束(GCIB)设备及超表面平滑的发展
GCIB技术已被用于半导体、光学和磁性器件的制造。它也显示了纳米级制造的可能性。在当前材料加工的要求中,表面平滑在纳米精度范围内变得非常重要。本文介绍了用于透镜模具和刀具表面光滑的紧凑型GCIB设备的研制。对于WC透镜模具和CVD金刚石刀具的表面光滑,已经实现了小于1 nm的粗糙度(Ra)的生产规模。研究还表明,GCIB工艺可以使这些材料的平滑度小于晶粒尺寸。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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