The drift/diffusion ratio of the MOS transistor drain current

A. Rusu, A. Ionescu, S. Eftimie
{"title":"The drift/diffusion ratio of the MOS transistor drain current","authors":"A. Rusu, A. Ionescu, S. Eftimie","doi":"10.1109/SMICND.2008.4703410","DOIUrl":null,"url":null,"abstract":"The paper presents a new method to evaluate the ratio between the two components of drain current in MOS transistors: drift and diffusion. By setting certain limits for this ratio, the moderate inversion region can be delimited in transfer electrical characteristics. The limits of the moderate inversion give the possibility for a more accurate applying of the continuous models. Some examples are given by extracting the main model parameters for a sub-micron MOS transistor and the limits of moderate inversion are compared with the results obtained using other models.","PeriodicalId":6406,"journal":{"name":"2008 IEEE International Conference on Semiconductor Electronics","volume":"130 6 1","pages":"305-308"},"PeriodicalIF":0.0000,"publicationDate":"2008-12-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2008 IEEE International Conference on Semiconductor Electronics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMICND.2008.4703410","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

The paper presents a new method to evaluate the ratio between the two components of drain current in MOS transistors: drift and diffusion. By setting certain limits for this ratio, the moderate inversion region can be delimited in transfer electrical characteristics. The limits of the moderate inversion give the possibility for a more accurate applying of the continuous models. Some examples are given by extracting the main model parameters for a sub-micron MOS transistor and the limits of moderate inversion are compared with the results obtained using other models.
MOS晶体管漏极电流的漂移/扩散比
本文提出了一种新的测量MOS晶体管漏极电流两个分量漂移和扩散之比的方法。通过对该比值设置一定的限制,可以在传递电特性中划定中等反转区域。中等反演的局限性为更精确地应用连续模型提供了可能。通过提取亚微米MOS晶体管的主要模型参数,给出了一些算例,并与其他模型的结果进行了适度反演的极限比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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