Strain induced modification in physical properties of charge-ordered insulator BaBiO3 thin films

S. Sarkar, S. Chowdhury, R. Raghunathan, R. Choudhary, D. Phase
{"title":"Strain induced modification in physical properties of charge-ordered insulator BaBiO3 thin films","authors":"S. Sarkar, S. Chowdhury, R. Raghunathan, R. Choudhary, D. Phase","doi":"10.1063/1.5130349","DOIUrl":null,"url":null,"abstract":"Oriented thin films have been prepared using pulsed laser deposition technique on Si (001) and SrTiO3 (STO) (001) substrates. The surface morphologies of films grown on Si substrates are more uniform than STO substrate. Physical properties of BaBiO3 thin films have been studied using Raman and x-ray photoelectron spectroscopic (XPS) techniques. Room temperature Raman spectroscopy confirms the presence of charge-ordering both in bulk and thin films. Our XPS results however show that the charge-disproportionation of Bi oxidation state (4-δ) and (4+δ) with δ<1 in bulk has been modified in thin films to δ=1.Oriented thin films have been prepared using pulsed laser deposition technique on Si (001) and SrTiO3 (STO) (001) substrates. The surface morphologies of films grown on Si substrates are more uniform than STO substrate. Physical properties of BaBiO3 thin films have been studied using Raman and x-ray photoelectron spectroscopic (XPS) techniques. Room temperature Raman spectroscopy confirms the presence of charge-ordering both in bulk and thin films. Our XPS results however show that the charge-disproportionation of Bi oxidation state (4-δ) and (4+δ) with δ<1 in bulk has been modified in thin films to δ=1.","PeriodicalId":20725,"journal":{"name":"PROCEEDINGS OF THE INTERNATIONAL CONFERENCE ON ADVANCED MATERIALS: ICAM 2019","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2019-10-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"PROCEEDINGS OF THE INTERNATIONAL CONFERENCE ON ADVANCED MATERIALS: ICAM 2019","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1063/1.5130349","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

Oriented thin films have been prepared using pulsed laser deposition technique on Si (001) and SrTiO3 (STO) (001) substrates. The surface morphologies of films grown on Si substrates are more uniform than STO substrate. Physical properties of BaBiO3 thin films have been studied using Raman and x-ray photoelectron spectroscopic (XPS) techniques. Room temperature Raman spectroscopy confirms the presence of charge-ordering both in bulk and thin films. Our XPS results however show that the charge-disproportionation of Bi oxidation state (4-δ) and (4+δ) with δ<1 in bulk has been modified in thin films to δ=1.Oriented thin films have been prepared using pulsed laser deposition technique on Si (001) and SrTiO3 (STO) (001) substrates. The surface morphologies of films grown on Si substrates are more uniform than STO substrate. Physical properties of BaBiO3 thin films have been studied using Raman and x-ray photoelectron spectroscopic (XPS) techniques. Room temperature Raman spectroscopy confirms the presence of charge-ordering both in bulk and thin films. Our XPS results however show that the charge-disproportionation of Bi oxidation state (4-δ) and (4+δ) with δ<1 in bulk has been modified in thin films to δ=1.
电荷有序绝缘体BaBiO3薄膜物理性能的应变诱导修饰
采用脉冲激光沉积技术在Si(001)和SrTiO3 (STO)(001)衬底上制备了取向薄膜。在Si衬底上生长的薄膜表面形貌比STO衬底更均匀。利用拉曼光谱和x射线光电子能谱(XPS)技术研究了氯化钡薄膜的物理性质。室温拉曼光谱证实了体膜和薄膜中电荷有序的存在。然而,我们的XPS结果表明,体积δ<1的Bi氧化态(4-δ)和(4+δ)的电荷歧化在薄膜中被修饰为δ=1。采用脉冲激光沉积技术在Si(001)和SrTiO3 (STO)(001)衬底上制备了取向薄膜。在Si衬底上生长的薄膜表面形貌比STO衬底更均匀。利用拉曼光谱和x射线光电子能谱(XPS)技术研究了氯化钡薄膜的物理性质。室温拉曼光谱证实了体膜和薄膜中电荷有序的存在。然而,我们的XPS结果表明,体积δ<1的Bi氧化态(4-δ)和(4+δ)的电荷歧化在薄膜中被修饰为δ=1。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信