Fan-Out Wafer Level Packaging Development Line

Chai Tc, D. Ho, Chong Sc, Hsiao Hy, Serine Soh, S. Lim, S. Ps, E. Wai, Lau Bl, Seit Ww, Lau Gk, Phua Ts, K.C.S. Lim, S. Sh, Ye Yl
{"title":"Fan-Out Wafer Level Packaging Development Line","authors":"Chai Tc, D. Ho, Chong Sc, Hsiao Hy, Serine Soh, S. Lim, S. Ps, E. Wai, Lau Bl, Seit Ww, Lau Gk, Phua Ts, K.C.S. Lim, S. Sh, Ye Yl","doi":"10.1109/EPTC50525.2020.9315155","DOIUrl":null,"url":null,"abstract":"With the slowing down of Moore's law, the semiconductor industry is increasingly looking to advanced packaging for achieving system scaling at packaging level. Across the industry, in high volume factories that support assembly and packaging of semiconductor ICs, fabless companies, foundries, equipment and materials developers, increased constraints are seen in terms of allocating resources for research and development of advanced packaging technologies and solutions to meet market requirements. IME has worked with multiple industry partners to establish a FOWLP development Line to address these challenges to build broad advanced-packaging platforms to enable product and technology pathfinding for industry applications such as mobility, 5G, mmWave, Data Centre and automotive requirements This paper will provide an overview of the FOWLP development line, review of mold 1st and RDL 1st FOWLP technologies with multi-layer 2um line and spacing, RDL process and integration on 300mm wafer. The example of few novel packaging approaches such as large size RDL molded interposer with and without embedded fine interconnect chip, 3D integrated package-on-package, and the 2-layer molded antenna-in-package will be described.","PeriodicalId":6790,"journal":{"name":"2020 IEEE 22nd Electronics Packaging Technology Conference (EPTC)","volume":"151 1","pages":"440-444"},"PeriodicalIF":0.0000,"publicationDate":"2020-12-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 IEEE 22nd Electronics Packaging Technology Conference (EPTC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EPTC50525.2020.9315155","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

With the slowing down of Moore's law, the semiconductor industry is increasingly looking to advanced packaging for achieving system scaling at packaging level. Across the industry, in high volume factories that support assembly and packaging of semiconductor ICs, fabless companies, foundries, equipment and materials developers, increased constraints are seen in terms of allocating resources for research and development of advanced packaging technologies and solutions to meet market requirements. IME has worked with multiple industry partners to establish a FOWLP development Line to address these challenges to build broad advanced-packaging platforms to enable product and technology pathfinding for industry applications such as mobility, 5G, mmWave, Data Centre and automotive requirements This paper will provide an overview of the FOWLP development line, review of mold 1st and RDL 1st FOWLP technologies with multi-layer 2um line and spacing, RDL process and integration on 300mm wafer. The example of few novel packaging approaches such as large size RDL molded interposer with and without embedded fine interconnect chip, 3D integrated package-on-package, and the 2-layer molded antenna-in-package will be described.
扇形圆片级封装开发线
随着摩尔定律的放缓,半导体行业越来越多地寻求先进的封装来实现封装级的系统扩展。在整个行业中,支持半导体集成电路组装和封装的大批量工厂、无晶圆厂公司、代工厂、设备和材料开发商,在分配资源用于研发先进封装技术和解决方案以满足市场需求方面,受到的限制越来越大。IME与多个行业合作伙伴合作建立了FOWLP开发线,以应对这些挑战,建立广泛的先进封装平台,为移动、5G、毫米波、数据中心和汽车等行业应用提供产品和技术寻路。本文将概述FOWLP开发线,回顾具有多层2um线和间距的模具1和RDL 1 FOWLP技术,RDL工艺和300mm晶圆上的集成。本文将介绍一些新颖的封装方法,如大尺寸RDL模制中间层,有或没有嵌入精细互连芯片,3D集成封装,以及封装中2层模制天线。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信