The effects of bi-layer catalysts and its annealing on the growth of GaN nanowires

D. Kuo, Wei-Ting Shen
{"title":"The effects of bi-layer catalysts and its annealing on the growth of GaN nanowires","authors":"D. Kuo, Wei-Ting Shen","doi":"10.1109/INEC.2010.5425038","DOIUrl":null,"url":null,"abstract":"We report an evaporation reaction to synthesize GaN nanowires at 800°C on metallic bi-layer catalyst-coated substrates and on the bi-layer catalyst-annealed substrates through the reaction of GaN and NH3. The annealing temperatures of catalyst layers before the GaN growth were 700°C and 850°C. Bi-layer metallic catalysts were constituted with Au, Ni, Al, and In. The growth differences caused by the stacking sequence of bi-layer catalysts and the annealing conditions were investigated. The understanding of those differences can help to know the growth mechanism.","PeriodicalId":6390,"journal":{"name":"2010 3rd International Nanoelectronics Conference (INEC)","volume":"26 1","pages":"1064-1065"},"PeriodicalIF":0.0000,"publicationDate":"2010-03-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 3rd International Nanoelectronics Conference (INEC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/INEC.2010.5425038","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

We report an evaporation reaction to synthesize GaN nanowires at 800°C on metallic bi-layer catalyst-coated substrates and on the bi-layer catalyst-annealed substrates through the reaction of GaN and NH3. The annealing temperatures of catalyst layers before the GaN growth were 700°C and 850°C. Bi-layer metallic catalysts were constituted with Au, Ni, Al, and In. The growth differences caused by the stacking sequence of bi-layer catalysts and the annealing conditions were investigated. The understanding of those differences can help to know the growth mechanism.
双层催化剂及其退火对氮化镓纳米线生长的影响
本文报道了在金属双层催化剂包覆基底和双层催化剂退火基底上,通过氮化镓与NH3的反应,在800℃下蒸发合成氮化镓纳米线。GaN生长前催化剂层的退火温度分别为700℃和850℃。采用Au、Ni、Al、In组成了双层金属催化剂。研究了双层催化剂的堆叠顺序和退火条件对生长差异的影响。了解这些差异有助于了解生长机制。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信