Refined Analysis of Low-Temperature Data of Hall-Effect Measurements on Sb-Doped n-Ge on the Basis of an Impurity-Hubbard-Band Model

Y. Kajikawa
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引用次数: 5

Abstract

The Hall-effect measurement data on Sb-doped n-Ge reported by Fritzsche [J. Phys. Chem. Solids 6, 69 (1958)] have been analyzed considering not only the bottom Hubbard band formed from the neutral donor (D0) states but also the top Hubbard band formed from the negatively charged donor (D−) states. Taking into account the degeneracy factors for the D0 and D− states as well as the dependence of the dielectric constant on the concentration of the D0 states, simultaneous fits to the experimental data of the temperature-dependent conductivity and the Hall coefficient have been performed with assuming the hopping drift mobility expressed as μi = μ0i(Eμi/kBT)3/2exp(−Eμi/kBT) and the hopping Hall factor expressed as AHi = (kBT/IHi)exp(KHEμi/kBT), where i = 2 and 3 for the top and the bottom Hubbard band, respectively. The deduced values of Eμ3 from the fits have been proved to be well explained by the molecular-pair theory. The energy separation U between the top and the bottom Hubbard band has also been obtained through the fits with assuming U = Eμ2. It is shown that the fits have been satisfactorily performed with assuming a constant value of KH= 2/3.
基于杂质- hubard - band模型的sb掺杂n-Ge霍尔效应低温测量数据精细化分析
Fritzsche报道的sb掺杂n-Ge的霍尔效应测量数据[J]。理论物理。化学。固体6,69(1958)]不仅考虑了由中性供体(D0)状态形成的底部哈伯德带,而且考虑了由带负电荷的供体(D -)状态形成的顶部哈伯德带。考虑到D0和D -态的简并因子以及介电常数对D0态浓度的依赖性,同时拟合温度相关电导率和霍尔系数的实验数据,假设跳变漂移迁移率为μi = μ0i(Eμi/kBT)3/2exp(−Eμi/kBT),跳变霍尔因子为AHi = (kBT/IHi)exp(KHEμi/kBT)。其中i分别为顶部和底部哈伯德带的2和3。由拟合得到的Eμ3值可以用分子对理论很好地解释。假设U = Eμ2,通过拟合得到了上下哈伯德带之间的能量分离U。结果表明,当KH= 2/3时,拟合结果令人满意。
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