The growth of AgGaTe2 layer on Si substrate by two-step closed space sublimation and its application to solar cell fabrications

A. Uruno, M. Kobayashi
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Abstract

The AgGaTe2 layer was formed on Ag2Te/Si structure with two different procedures by eliminating the melt-back etching. Diffusion of the Ga2Te3 source material into the Ag2Te layer and formation of the AgGaTe2 layer were both occurring during the growth when Ag2Te and Ga2Te3 source mixture was used to form AgGaTe2. It was also clear the AgGaTe2 could be formed by deposition and annealing of Ga2Te3 layer on top of the Ag2Te/Si structure. Solar cells were fabricated using the p-AgGaTe2/n-Si heterojunction, and showed conversion efficiency of approximately 3%.
硅衬底上两步封闭空间升华生长AgGaTe2层及其在太阳能电池制造中的应用
通过消除熔背腐蚀,采用两种不同的工艺在Ag2Te/Si结构上形成AgGaTe2层。使用Ag2Te和Ga2Te3源混合物形成AgGaTe2时,生长过程中都发生了Ga2Te3源材料向Ag2Te层扩散和AgGaTe2层的形成。在Ag2Te/Si结构上沉积和退火Ga2Te3层也可以形成AgGaTe2。利用p-AgGaTe2/n-Si异质结制备了太阳能电池,其转换效率约为3%。
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