Statistical approach to the process of tunnel ionisation of impurity centres near the heterointerface

T. Muratov
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Abstract

To date, the processes of tunnel ionisation of impurities near the interface between two different semiconductors have been comprehensively studied. The most important parameters of the contact electron states of impurities have been determined. However, the calculated expressions for these parameters have been of local nature, as applied to individual impurities. Meanwhile, it is easy to understand that a number of processes, such as the flow of charge carriers and their diffusion through a heterojunction, are clearly statistical in nature. The same applies to the processes of tunnel ionisation of shallow and/or deep impurities near the interface. A statistical approach to the calculation of the parameters of tunnel ionisation of impurities broadens the opportunities for obtaining fundamental information regarding surface electronstates.The aim of this work was to use a statistical approach to study the effect of the heterointerface on the energy spectrum of shallow and deep centres. For this purpose, the expansion of the reflected quasi-classical wave function within the complete system of spherical harmonics and the subsequent extraction of the zero harmonic amplitude (s-component) was used to estimate the minimum distance from the impurity to the heterobarrier and to specify the limitations of the applicability of the results obtained in other works. The article analyses the conditions of the quasi-classical approximation which are used to estimate the order of the value for the minimum height of the potential barrier (pit).This work (with due consideration given to the minimum distance estimate) presents averaged formulas obtained for the energy shift of the ground state and the lifetime of the quasi-stationary state depending on the distance from the heterobarrier. Some qualitatively new considerations can also be found in the article. The distribution of impurity centres near the heterobarrier is assumed to be uniform. The article discusses the role of electron transitions in causing the buffer field effect for both shallow and deep centres. The focus of the article is on the estimates of various physical parameters characterising electron transitions near the heterobarrier.
异质界面附近杂质中心隧道电离过程的统计方法
迄今为止,杂质在两种不同半导体界面附近的隧道电离过程已经得到了全面的研究。确定了杂质接触电子态的最重要参数。然而,这些参数的计算表达式是局部性质的,适用于个别杂质。同时,很容易理解的是,许多过程,如电荷载流子的流动及其通过异质结的扩散,本质上显然是统计的。这同样适用于界面附近浅层和/或深层杂质的隧道电离过程。计算杂质隧道电离参数的统计方法拓宽了获得有关表面电子态的基本信息的机会。本工作的目的是利用统计方法研究异质界面对浅层和深层中心能谱的影响。为此,利用球面谐波完备系统内反射的准经典波函数展开和随后的零谐波振幅(s分量)提取来估计杂质到杂势垒的最小距离,并明确了其他著作中所得结果适用性的局限性。本文分析了估计势垒(坑)最小高度值阶的准经典近似的条件。这项工作(适当考虑了最小距离估计)给出了基态能量位移和准稳态寿命随与异位垒距离的平均公式。在本文中还可以找到一些定性上的新考虑。假设杂质中心在异质势垒附近的分布是均匀的。本文讨论了电子跃迁在造成浅中心和深中心缓冲场效应中的作用。本文的重点是对表征电子在异位垒附近跃迁的各种物理参数的估计。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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