A Contour Mode AIN Piezoelectric Resonator based on SOI Substrate

Sitao Fei, Hao Ren
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引用次数: 2

Abstract

Aluminum nitride (AIN) piezoelectric MEMS resonators have been extensively developed in recent years due to their small size and CMOS compatibility. In this paper, a simple microfabrication process based on Silicon on Insulator (SOI) is presented to fabricate a contour mode resonator, and the piezoelectric material is aluminum nitride (AIN). SOI wafer is directly applied as the substrate and patterned as bottom electrode. Theoretical calculation and finite element method simulation is performed to estimate the resonant frequency. X-Ray Diffraction (XRD) is used to detect the full width at half maximum (FWHM) of AIN which is 0.164°. AFM is applied to measure the roughness of AIN film and the measured RMS roughness is 0.87 nm. Vector network analyzer and probe stations are applied to measure the one- port S parameter. It is founded that the result of resonant frequency is very close between the simulation and the actual measurement which is 146.9MHz and 144MHz. The resonator may find wide application in biosensing.
基于SOI衬底的轮廓型AIN压电谐振器
氮化铝(AIN)压电式MEMS谐振器由于其体积小、与CMOS兼容,近年来得到了广泛的发展。本文提出了一种基于绝缘体上硅(SOI)的简单微加工工艺,以氮化铝(AIN)为压电材料制作轮廓模谐振器。SOI晶圆片直接作为衬底,作为底电极进行图案化处理。通过理论计算和有限元模拟对谐振频率进行了估计。用x射线衍射(XRD)检测了AIN的半最大宽度(FWHM)为0.164°。采用原子力显微镜对AIN膜的粗糙度进行测量,测得的RMS粗糙度为0.87 nm。采用矢量网络分析仪和探针站对单端口S参数进行测量。仿真结果表明,谐振频率分别为146.9MHz和144MHz,与实测结果非常接近。该谐振器在生物传感领域具有广泛的应用前景。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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