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Optimization of Annealing of Dopants and Radiation Defects During Manufacturing a Heterobipolar Transistors

Q4 Engineering
International Journal of Mechatronics and Automation Pub Date : 2014-03-01 DOI:10.1166/JOM.2014.1032
E. Pankratov, E. Bulaeva
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来源期刊
International Journal of Mechatronics and Automation
International Journal of Mechatronics and Automation Engineering-Industrial and Manufacturing Engineering
CiteScore
1.60
自引率
0.00%
发文量
19
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