Distant BI-Gram model, collocation, and their applications in post-processing for Chinese character recognition

Ruifeng Xu, Q. Lu, D. Yeung, Xi-Zao Wang
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Abstract

In this paper, we present a distant BI-Gram model, which extended the regular BI-Gram model by considering the distance information and weight parameters, in order to describe the long-distance restrictions among the Chinese sentence. The extraction of the statistical information and weight parameters of this language model is discussed. Based on this work, the word combination strength and spread are employed to extract the recurrent word combinations, i.e. collocations. The distant BI-Gram model and collocation are applied to a statistic-based post-processing system for improving the recognition performance of Chinese characters. The experimental results show that by employing these two language models, the post-processing system achieves a higher improvement performance.
远距双元图模型、配置及其在汉字识别后处理中的应用
本文通过考虑距离信息和权值参数,在常规BI-Gram模型的基础上,提出了一种远程BI-Gram模型,用于描述汉语句子之间的距离限制。讨论了该语言模型的统计信息和权重参数的提取。在此基础上,利用单词组合强度和传播度来提取重复出现的单词组合,即collocations。为了提高汉字的识别性能,将远距双元图模型和搭配应用到基于统计的后处理系统中。实验结果表明,采用这两种语言模型,后处理系统取得了较高的改进性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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