Recent Developments in Gas Cluster Ion Beam Technology

Abstract

Gas cluster ion beam (GCIB) exhibit unique irradiation eŠects such as dense energy deposition, low-damage irradiation, and surface smoothing eŠects. Especially, low-damage sputtering of organic materials is one of the hot applications of GCIB. However, it is still necessary to improve beam properties of GCIB. In this paper, we will review characterization of GCIB regarding formation of multiply charged GCIB and eŠects of collisions with residual gas. As recent applications of GCIB, etching enhancement by introduction of reactive background gas, and a nano-fabrication of magnetic recording device by GCIB are explained.