Boosting the Performance of β‐Ga2O3 Solar‐Blind Deep UV Photodetectors by Balancing the Photocurrent and Dark Current via the IZO Interlayer

Zeyulin Zhang, Qingwen Song, Hao Yuan, Fengyu Du, Runping Ma, Dinghe Liu, Yuming Zhang, P. Yan, Dazheng Chen, Chunfu Zhang, Yue Hao
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Abstract

There is a tradeoff between the high photocurrent and the low dark current for the gallium oxide (Ga2O3) metal–semiconductor–metal photodetectors (PDs). Achieving a balance between the photocurrent and dark current is crucial to the final device's performance. Herein, indium zinc oxide (IZO) is introduced between the Ga2O3 and the metal contact for the first time. By adjusting the IZO interlayer thickness and the annealing temperature, the barrier height between Ga2O3 and the metal contact can be well controlled. In detail, the β‐Ga2O3 film is epitaxially grown by mist chemical vapor deposition, and the different thicknesses of IZO are deposited under Ti/Au electrode. The devices with 10 nm IZO interlayer and 300 °C annealing temperatures have an obvious device performance improvement, which has achieved responsivity (R) of 508 A W−1, a high peak detectivity (D*) of 2.65 × 1015 Jones, and a raised‐up relaxation time of 0.25 s (fast) and 1.22 s (slow). Compared with the device without IZO, the performances get obviously enhanced. Hence, the work hopes to promote the development of the β‐Ga2O3 solar‐blind deep UV PDs.
通过IZO中间层平衡光电流和暗电流来提高β - Ga2O3太阳盲深紫外探测器的性能
对于氧化镓(Ga2O3)金属-半导体-金属光电探测器(PDs)来说,在高光电流和低暗电流之间存在权衡。实现光电流和暗电流之间的平衡对最终器件的性能至关重要。本文首次在Ga2O3与金属触点之间引入铟氧化锌(IZO)。通过调整IZO层间厚度和退火温度,可以很好地控制Ga2O3与金属接触面之间的势垒高度。采用雾状化学气相沉积法外延生长β - Ga2O3薄膜,并在Ti/Au电极下沉积不同厚度的IZO。在300°C退火温度下,采用10 nm IZO中间层的器件性能得到了明显改善,器件的响应率(R)为508 A W−1,峰值探测率(D*)为2.65 × 1015 Jones,上升弛豫时间为0.25 s(快)和1.22 s(慢)。与不带IZO的器件相比,性能有明显提高。因此,该工作有望促进β - Ga2O3太阳盲深紫外pd的发展。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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