Test and debug strategy for TSMC CoWoS™ stacking process based heterogeneous 3D IC: A silicon case study

S. Goel, S. Adham, Min-Jer Wang, Ji-Jan Chen, Tze-Chiang Huang, Ashok Mehta, F. Lee, V. Chickermane, B. Keller, Thomas Valind, Subhasish Mukherjee, Navdeep Sood, Jeongho Cho, Hayden Lee, Jungi Choi, Sang-Duek Kim
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引用次数: 32

Abstract

Recent advances in semiconductor process technology especially interconnects using Through Silicon Vias (TSVs) enable the heterogeneous system integration where dies are implemented in dedicated, optimized process technologies and stacked in a 3D form. TSMC has developed the CoWoS™ (Chip on Wafer on Substrate) process as a design paradigm to assemble silicon interposer-based 3D ICs. To reach quality requirements for volume production, several test challenges related to 3D ICs need to be addressed. This paper describes the test and debug strategy used in designing a CoWoS™ based stacked IC. The 3D design presented in the paper contains three heterogeneous dies (a logic, a DRAM, and a JEDEC Wide-I/O compliant DRAM) stacked on the top of a passive interposer. For passive interposer testing, a novel test methodology called Pretty-Good-Die (PGD) test is presented, while for inter-die test, a novel scalable multi-tower 3D DFT architecture is presented. Silicon results show that most of the test challenges can be solved efficiently if planned properly; and 3D ICs are reality and not a fiction anymore.
基于TSMC coos™堆叠工艺的异构3D集成电路测试与调试策略:以硅为例研究
半导体工艺技术的最新进展,特别是使用硅通孔(tsv)的互连,使异质系统集成成为可能,其中芯片采用专用的优化工艺技术,并以3D形式堆叠。台积电开发了coos™(晶圆基板上芯片)工艺,作为组装基于硅中间层的3D集成电路的设计范例。为了达到量产的质量要求,需要解决与3D集成电路相关的几个测试挑战。本文描述了用于设计基于coos™的堆叠IC的测试和调试策略。文中提出的3D设计包含三个异构芯片(逻辑,DRAM和JEDEC Wide-I/O兼容DRAM)堆叠在无源中间层的顶部。对于无源中间体测试,提出了一种新的测试方法,即PGD测试,而对于中间体测试,提出了一种新的可扩展的多塔三维DFT架构。硅测试结果表明,如果计划得当,大多数测试挑战都可以有效地解决;3D集成电路已经成为现实,不再是虚构的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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