Activation energy of frequency-dependent drain-conductance of AlGaN/GaN HEMT evaluated with low frequency S-parameters

A. Wakejima, T. Narita, Y. Katayama, Keiichi Tamesue, T. Egawa
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Abstract

In this paper, we reveal an activation energy of a frequency-dependent drain conductance in AlGaN/GaN HEMT. Firstly, using two-port vector network characteristics at a low frequency less than MHz, it is confirmed that frequency dependence of a drain conductance (Gd) results in peculiar behavior in S22 of the AlGaN/GaN HEMT. In order to obtain the activation energy of the process of the frequency response of the Gd, we evaluate temperature dependence of a time constant (τ) of the frequency-dependent Gd, which can be obtained by exponential fitting of the Gd. With an Arrhenius plot for the Gd, the activation energy of the process can be estimated to be 0.13 eV. This activation energy is as exactly same as that we obtained from pulsed I-V measurements with which an electron capture process can be evaluated. Therefore, peculiar behavior in S22 we observed in very low frequency two-port network measurements is concluded to result from the electron capture process in the epitaxial layer.
用低频s参数评价频率相关的AlGaN/GaN HEMT漏导活化能
在本文中,我们揭示了AlGaN/GaN HEMT中频率相关漏极电导的活化能。首先,利用频率小于MHz的双端口矢量网络特性,证实了漏极电导(Gd)的频率依赖性导致了AlGaN/GaN HEMT的S22的特殊行为。为了获得Gd频率响应过程的活化能,我们评估了频率相关Gd的时间常数τ的温度依赖性,该常数可以通过Gd的指数拟合得到。通过Gd的Arrhenius图,可以估计该过程的活化能为0.13 eV。这个活化能与我们从脉冲I-V测量中得到的活化能完全相同,用脉冲I-V测量可以评估电子捕获过程。因此,我们在极低频双端口网络测量中观察到的S22的特殊行为可以推断为外延层中电子捕获过程的结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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