Metal/Ge Schottky barrier modulation with C-containing layer by chemical bath

Wei Wang, Jing Wang, Mei Zhao, R. Liang, Jun Xu
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Abstract

We inserted a C-containing layer in a metal/Ge structure, using a chemical bath. This layer enabled the Schottky barrier height (SBH) to be modulated. The chemical bath with 1-octadecene and 1-dodecene were performed separately with Ge substrates. The ultrathin C-containing layer stops the penetration of free electron wave functions from the metal to the Ge. Metal-induced gap states are alleviated and the pinned Fermi level is released. The SBH is lowered to 0.17 eV. This new formation method is promising and much less complex than traditional ones.
化学浴含c层金属/锗肖特基势垒调制
我们使用化学浴将含c层插入到金属/锗结构中。该层使肖特基势垒高度(SBH)能够被调制。以Ge为底物,分别对1-十八烯和1-十二烯进行化学浴。超薄的含c层阻止了自由电子波函数从金属到Ge的渗透。金属诱导的间隙态得到缓解,被钉住的费米能级得到释放。SBH降至0.17 eV。这种新的地层方法很有前途,而且比传统的地层方法简单得多。
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