Effect of Interaction Between Multiple Defects on Z-Depth Estimate in Lock-in Thermography Applications

B. Ravi, Mayue Xie, D. Goyal
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引用次数: 1

Abstract

In the recent years, 3D packaging has become a major enabler for heterogeneous integration of multiple functional devices and different nodes into a single package. The integration of multiple devices into 3D packages poses significant challenges when it comes to electrical fault isolation and failure analysis. With 3D packages, non-destructive fault isolation is important so as to accurately isolate the defect to the specific part of the failing package. This is critical since the different components in a 3D package are often owned by different suppliers and accurate non-destructive fault isolation will facilitate further root cause analysis and failure disposition by the concerned suppliers. Much higher sensitivity and better resolution in defect depth are two critical capabilities required for 3D packages. Lock-in Thermography (LIT) is a powerful non-destructive fault isolation technique for thermally active defects in semiconductor packages. With the integration of multiple components into 3D packages, the challenge lies in the added complexity in terms of the number of active devices and routing inside the package. More often than not, we have multiple defects inside the package at the same time. This study presents a fundamental analysis on the interaction between multiple defects in a package and its effect on defect depth estimate accuracy in lock-in thermography applications. In addition, data from real test cases have also been presented, which help better understand the interaction between multiple defects and provide confidence in the proposed correlations. The learnings from this study will facilitate tool and technique development and benefit failure analysis and 3D package development community.
锁相热成像中多缺陷间相互作用对z -深度估计的影响
近年来,3D封装已成为将多个功能设备和不同节点异构集成到单个封装中的主要推动力。当涉及到电气故障隔离和故障分析时,将多个设备集成到3D封装中会带来重大挑战。对于3D封装来说,无损故障隔离非常重要,这样才能准确地将缺陷隔离到故障封装的特定部分。这一点至关重要,因为3D封装中的不同组件通常由不同的供应商拥有,而准确的非破坏性故障隔离将有助于相关供应商进一步分析根本原因和处理故障。更高的灵敏度和更好的缺陷深度分辨率是3D封装所需的两个关键能力。锁定热成像技术(LIT)是一种强大的非破坏性故障隔离技术,用于半导体封装中的热活性缺陷。随着多个组件集成到3D封装中,挑战在于在封装内的活动设备数量和路由方面增加了复杂性。通常情况下,我们同时在包中有多个缺陷。本研究对封装中多个缺陷之间的相互作用及其对锁定热成像应用中缺陷深度估计精度的影响进行了基本分析。此外,来自真实测试用例的数据也被呈现出来,这有助于更好地理解多个缺陷之间的交互,并为所建议的相关性提供信心。从这项研究中获得的经验将有助于工具和技术的开发,并有利于故障分析和3D封装开发社区。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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