Effects of energy band structure on gallium arsenide based MOSFET

Wut Hmone Kyaw, May Nwe Myint Aye
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Abstract

This research work is focused on material science and semiconductor engineering. It emphasized on the semiconductor material such as Gallium arsenide (GaAs). The Gallium arsenide semiconductor material was used as a group III-V compound for metal-oxide semiconductor field effect transistor (MOSFET) modeling.  The band-gap energy structures were analyzed by using material parameters such as Varshni parameters, temperature and doping concentrations. Then, an electrical characteristic was carried out depending on the current and voltage relationship. The current flowing in the device is associated with a gate voltage applied to the device. From this paper, the analysis of MOSFET modeling was investigated using mathematical equations and MATLAB simulation.
能带结构对砷化镓基MOSFET的影响
主要研究方向为材料科学和半导体工程。重点介绍了砷化镓(GaAs)等半导体材料。砷化镓半导体材料作为III-V族化合物用于金属氧化物半导体场效应晶体管(MOSFET)建模。利用Varshni参数、温度和掺杂浓度等材料参数对带隙能量结构进行了分析。然后,根据电流和电压的关系进行电特性分析。流过器件的电流与施加到器件上的栅极电压相关联。本文利用数学方程和MATLAB仿真对MOSFET的建模进行了分析。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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