Comprehensive Characterization of All Inorganic and Organic Components in Neutral Tin Plating Bath for Electronics Applications

E. Shalyt, Jingjing Wang, Vishal Parekh, Chuannan Bai, Guang Liang
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Abstract

Tin plating at neutral and near-neutral pH is the preferable process in the application of electronic components such as capacitors and resistors, where the chemically sensitive ceramic and glass portions can be damaged by highly acidic solutions (often used in semiconductor packaging processes). Stannous ions are not as stable at elevated pH due to oxidation and hydrolysis, and plating demands the use of a large number of additives making the process control very challenging. Various analytical techniques are developed for automatic and comprehensive characterization of all inorganic and organic bath components including simultaneous detection of conductive salt, anti-whisker and chelator by near-infrared (NIR) spectroscopy, brightener by potentiometric titration, stannous ions by electrochemical method, and the breakdown stannic ions by spectro-titration.
电子中性镀锡浴中所有无机和有机成分的综合表征
在中性和接近中性的pH值下镀锡是电容器和电阻器等电子元件应用的优选工艺,其中化学敏感的陶瓷和玻璃部分可能被高酸性溶液(通常用于半导体封装工艺)损坏。由于氧化和水解,锡离子在pH升高时不稳定,电镀需要使用大量添加剂,这使得过程控制非常具有挑战性。开发了多种分析技术,用于对所有无机和有机浴液成分进行自动和全面的表征,包括近红外(NIR)光谱同时检测导电盐、抗晶须和螯合剂,电位滴定法同时检测增白剂,电化学法同时检测锡离子,光谱滴定法同时检测击穿锡离子。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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