Effects of Resonator Volume on The Oscillator Near-Carrier Phase Noise

Parvin Akhkandi, Sina Moradian, Hakhamanesh Mansoorzare, R. Abdolvand
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Abstract

This paper reports the first study of near-carrier phase noise (PN) dependency on the resonator volume/harmonic-number in thin-film piezoelectric-on-substrate (TPoS) MEMS oscillators. Two lateral bulk-acoustic TPoS resonators with different volumes (3rd and 5th harmonic orders) were designed to operate at the same ∼25.6 MHz and fabricated on a $25\mu\mathrm{m}$ silicon on insulator (SOI) substrate. The devices chosen for this study have different volumes but exhibit identical Quality factor ($Q$) and insertion loss (IL). The measured PN of the oscillators built based on these two resonators are measured and it is observed that the one based on the 5th order resonator exhibits ∼6dB lower PN @1KHz frequency offset compared to the 3rd order device. Although our preliminary results are not conclusive enough, it is hypothesized that an inverse proportionality to the resonator volume/mass predicted by earlier models could also describe this observation.
谐振腔体积对振荡器近载波相位噪声的影响
本文首次研究了薄膜压电基板(TPoS) MEMS振荡器中近载流子相位噪声(PN)与谐振腔体积/谐波数的关系。设计了两个具有不同体积(3次和5次谐波阶)的横向体声TPoS谐振器,工作频率为相同的~ 25.6 MHz,并在$25\mu\ mathm {m}$绝缘体(SOI)衬底上制造。本研究选择的器械体积不同,但质量因子($Q$)和插入损耗(IL)相同。测量了基于这两个谐振器构建的振荡器的测量PN,并观察到基于5阶谐振器的振荡器在1khz频率偏移时的PN比3阶器件低约6dB。虽然我们的初步结果还不够确凿,但假设早期模型预测的谐振腔体积/质量的反比例也可以描述这一观察结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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