Creation of thin films on the surface of InP with a controlled gas-sensitive signal under the influence of PbO + Y2O3 compositions

V. F. Kostryukov, D. S. Balasheva, A. S. Parshina
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Abstract

Thin-film objects with a reproducible temperature dependence of the resistance, thermally stable, and easy to obtain can be used as the sensitive elements in semiconductor gas sensors. The aim of this study was to create thin films on the InP surface under the influence of an oxide chemostimulator + inert component (PbO + Y2O3, respectively) compositions and to determine their gas-sensitive properties and their dependence on the formula of the composition.Thin films were synthesised on the InP surface by the method of chemically stimulated thermal oxidation under the influence of various PbO + Y2O3 compositions. The thickness of the formed films, their elemental and chemical composition were determined (by laser ellipsometry, X-ray phase analysis, and infra-red spectroscopy). A number of experiments were carried out to establish the gas-sensitive properties of the obtained films with respect to ammonia with concentrations of 120, 100, and 80 ppm.By chemically stimulated thermal oxidation, we obtained thin films with semiconductor properties on the InP surface. It was determined that the samples had n-type conductivity. A gas-sensitive response was detected in the presence of ammonia in the atmosphere. The ability to create thin films with a predetermined value of sensory response was demonstrated 
在PbO + Y2O3的影响下,在InP表面形成具有可控气敏信号的薄膜
薄膜物体具有可重现的温度依赖性,热稳定,易于获得,可作为半导体气体传感器的敏感元件。本研究的目的是在氧化化学刺激剂+惰性成分(分别为PbO + Y2O3)组合物的影响下在InP表面形成薄膜,并确定它们的气敏性质及其对组合物配方的依赖。在不同PbO + Y2O3组成的影响下,采用化学刺激热氧化法在InP表面合成了薄膜。形成的薄膜的厚度,它们的元素和化学成分被确定(通过激光椭偏仪,x射线相分析,红外光谱)。进行了一系列实验,以确定所获得的膜对浓度为120、100和80 ppm的氨的气敏性能。通过化学刺激热氧化,我们在InP表面获得了具有半导体性质的薄膜。测定样品具有n型电导率。在大气中存在氨气时,检测到气敏反应。证明了制造具有预定感官反应值的薄膜的能力
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